Black phosphorus (BP) has potential for fabricating p-type transistors in ultra-thin 2D-material complementary circuits. However, as the synergetic effect of water and oxygen leads to performance degradation under an ambient atmosphere, it is urgent to develop a passivation strategy for robust stability. Herein, a scalable superhydrophobic passivation layer is designed to improve the stability of BP transistors, which consists of fluoroalkylsilane-coated titanium dioxide (TiO2) nanoparticles. Due to the superhydrophobic property of the passivation layer, the BP transistors preserve intrinsic performance in extremely wet conditions, including humid air, water, HCl, and KOH. After 28 days in atmospheric conditions, the performance presents only 20% channel current degradation and the device can work even after 60 days. This work not only experimentally demonstrates robust stable BP transistors in harsh conditions but also provides a highly efficient and damage-free strategy to suppress the influence of water adsorption in atmospheric conditions for highly stable 2D materials devices.
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14 September 2020
Research Article|
September 17 2020
Black phosphorus field effect transistors stable in harsh conditions via surface engineering
Special Collection:
2D Transistors
Bei Jiang;
Bei Jiang
1
Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University
, Changsha 410082, China
2
Faculty of Physics and Electronic Science, Hubei University
, Wuhan 430062, China
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Hao Huang;
Hao Huang
3
School of Physics and Technology, Wuhan University
, Wuhan 430072, China
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Rui Chen;
Rui Chen
3
School of Physics and Technology, Wuhan University
, Wuhan 430072, China
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Guoli Li
;
Guoli Li
1
Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University
, Changsha 410082, China
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Denis Flandre
;
Denis Flandre
1
Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University
, Changsha 410082, China
4
The ICTEAM Institute, Université Catholique de Louvain
, Louvain-la-Neuve 1348, Belgium
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Da Wan;
Da Wan
5
School of Information Science and Engineering, Wuhan University of Science and Technology
, Wuhan 430081, China
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Xue Chen;
Xue Chen
6
State Key Laboratory of High Power Semiconductor Lasers, Changchun University of Science and Technology
, Changchun 130022, China
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Xingqiang Liu
;
Xingqiang Liu
a)
1
Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University
, Changsha 410082, China
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Cong Ye
;
Cong Ye
a)
2
Faculty of Physics and Electronic Science, Hubei University
, Wuhan 430062, China
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Lei Liao
Lei Liao
1
Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University
, Changsha 410082, China
3
School of Physics and Technology, Wuhan University
, Wuhan 430072, China
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Appl. Phys. Lett. 117, 111602 (2020)
Article history
Received:
July 09 2020
Accepted:
August 22 2020
Citation
Bei Jiang, Hao Huang, Rui Chen, Guoli Li, Denis Flandre, Da Wan, Xue Chen, Xingqiang Liu, Cong Ye, Lei Liao; Black phosphorus field effect transistors stable in harsh conditions via surface engineering. Appl. Phys. Lett. 14 September 2020; 117 (11): 111602. https://doi.org/10.1063/5.0021335
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