SnS has recently been shown to possess unique valleytronic capability with a large polarization degree, where non-degenerate valleys can be accessed using linearly polarized light, bestowed upon by the unique anisotropy and wavefunction symmetry. It is thus of utmost importance to demonstrate the extension of such effects for the IV–VI system in general, thereby elucidating the generality and tunability of such valleytronics. We show the highly tunable valleytronics via gradual compositional control of the tin(II) sulfo-selenide (SnSxSe1−x) alloy system with excellent retainment of symmetry-determined selection rules. We show the presence of both ΓY and ΓX valleys in all alloy compositions via selectivity in absorption and emission of linearly polarized light by optical reflection (R)/transmission (T) and photoluminescence measurements and tuned the bandgaps of the valleys within a range of 1.28 eV–1.05 eV and 1.48 eV–1.24 eV, respectively. This simultaneous tuning of non-degenerate valleys agrees well with theoretical calculations. We then fitted the bandgap values in compositional space, obtaining bowing parameters as a useful database. We further demonstrated the feasibility of using IV–VI valleytronics systems in general by elucidating the retainment of strong polarization degrees of as high as 91% across all compositions. The generalization of such purely symmetry-dependent valleytronics also opens up opportunities for the discovery of more multi-functional materials.
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10 February 2020
Research Article|
February 12 2020
Tunable valleytronics with symmetry-retaining high polarization degree in SnSxSe1−x model system Available to Purchase
Shuren Lin;
Shuren Lin
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
2
The Molecular Foundry, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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Zixuan Fang;
Zixuan Fang
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
3
National Engineering Research Center of Electromagnetic Radiation Control Materials, State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China
, Chengdu 611731, People's Republic of China
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Tingzheng Hou
;
Tingzheng Hou
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
4
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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Ting Wan Hsu;
Ting Wan Hsu
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
5
Department of Materials Science and Engineering, National Tsing Hua University
, Hsinchu 30013, Taiwan
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Chi H. So;
Chi H. So
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
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Cher Yeoh;
Cher Yeoh
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
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Roger Li;
Roger Li
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
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Yin Liu;
Yin Liu
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
2
The Molecular Foundry, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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Emory M. Chan;
Emory M. Chan
2
The Molecular Foundry, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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Yu-Lun Chueh;
Yu-Lun Chueh
5
Department of Materials Science and Engineering, National Tsing Hua University
, Hsinchu 30013, Taiwan
6
State Key Laboratory of Advanced Processing and Recycling of Non-Ferrous Metals, Lanzhou University of Technology, School of Materials Science and Engineering, Lanzhou University of Technology
, Lanzhou 730050, People's Republic of China
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Bin Tang;
Bin Tang
3
National Engineering Research Center of Electromagnetic Radiation Control Materials, State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China
, Chengdu 611731, People's Republic of China
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Kristin Persson;
Kristin Persson
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
4
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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Jie Yao
Jie Yao
a)
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
4
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
7
Tsinghua-Berkeley Shenzhen Institute, University of California
, Berkeley, California 94720, United States
a)Author to whom correspondence should be addressed: [email protected]
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Shuren Lin
1,2
Zixuan Fang
1,3
Tingzheng Hou
1,4
Ting Wan Hsu
1,5
Chi H. So
1
Cher Yeoh
1
Roger Li
1
Yin Liu
1,2
Emory M. Chan
2
Yu-Lun Chueh
5,6
Bin Tang
3
Kristin Persson
1,4
Jie Yao
1,4,7,a)
1
Department of Materials Science and Engineering, University of California
, Berkeley, California 94720, USA
2
The Molecular Foundry, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
3
National Engineering Research Center of Electromagnetic Radiation Control Materials, State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China
, Chengdu 611731, People's Republic of China
4
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
5
Department of Materials Science and Engineering, National Tsing Hua University
, Hsinchu 30013, Taiwan
6
State Key Laboratory of Advanced Processing and Recycling of Non-Ferrous Metals, Lanzhou University of Technology, School of Materials Science and Engineering, Lanzhou University of Technology
, Lanzhou 730050, People's Republic of China
7
Tsinghua-Berkeley Shenzhen Institute, University of California
, Berkeley, California 94720, United States
a)Author to whom correspondence should be addressed: [email protected]
Appl. Phys. Lett. 116, 061105 (2020)
Article history
Received:
September 21 2019
Accepted:
February 01 2020
Citation
Shuren Lin, Zixuan Fang, Tingzheng Hou, Ting Wan Hsu, Chi H. So, Cher Yeoh, Roger Li, Yin Liu, Emory M. Chan, Yu-Lun Chueh, Bin Tang, Kristin Persson, Jie Yao; Tunable valleytronics with symmetry-retaining high polarization degree in SnSxSe1−x model system. Appl. Phys. Lett. 10 February 2020; 116 (6): 061105. https://doi.org/10.1063/1.5128717
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