Tunable volatile and non-volatile resistive switching devices were demonstrated with non-stoichiometric CuO nanowire. These resistive switching modes were controlled by the stability of hole-based conductive filaments via the compliance current in the SET process. The CuO-nanowire based volatile threshold switching selector exhibited a bidirectional operation with high selectivity (104), ultra-low OFF-current (<100 pA), and good reliability with the endurance over 105 cycles under the pulse operation. The present study demonstrates the nanowire-based threshold switching selector with the bottom-up method for future cross-point memory, logic application, and neuromorphic computing.
References
1.
S.
Yu
and P.
Chen
, IEEE Solid-State Circuits Mag.
8
, 43
(2016
).2.
J. Y.
Seok
, S. J.
Song
, J. H.
Yoon
, K. J.
Yoon
, T. H.
Park
, D. E.
Kwon
, H.
Lim
, G. H.
Kim
, D. S.
Jeong
, and C. S.
Hwang
, Adv. Funct. Mater.
24
, 5316
(2014
).3.
E.
Linn
, R.
Rosezin
, C.
Kügeler
, and R.
Waser
, Nat. Mater.
9
, 403
(2010
).4.
M.-J.
Lee
, C. B.
Lee
, D.
Lee
, S. R.
Lee
, M.
Chang
, J. H.
Hur
, Y.-B.
Kim
, C.-J.
Kim
, D. H.
Seo
, S.
Seo
, U. I.
Chung
, I.-K.
Yoo
, and K.
Kim
, Nat. Mater.
10
, 625
(2011
).5.
C.-H.
Huang
, J.-S.
Huang
, S.-M.
Lin
, W.-Y.
Chang
, J.-H.
He
, and Y.-L.
Chueh
, ACS Nano
6
, 8407
(2012
).6.
S.
Sheu
, P.
Chiang
, W.
Lin
, H.
Lee
, P.
Chen
, Y.
Chen
, T.
Wu
, F. T.
Chen
, K.
Su
, M.
Kao
, K.
Cheng
, and M.
Tsai
, “A 5ns fast write multi-level non-volatile 1 K bits RRAM memory with advance write scheme
,” in Symposium on VLSI Circuits (2009
), p. 82
.7.
J.
Huang
, T.
Yi-Ming
, L.
Wun-Cheng
, H.
Chung-Wei
, and T.
Hou
, “One selector-one resistor (1S1R) crossbar array for high-density flexible memory applications
,” in International Electron Devices Meeting (IEDM) (2011
).8.
W.
Lee
, J.
Park
, S.
Kim
, J.
Woo
, J.
Shin
, G.
Choi
, S.
Park
, D.
Lee
, E.
Cha
, B. H.
Lee
, and H.
Hwang
, ACS Nano
6
, 8166
(2012
).9.
C.-H.
Huang
, T.-S.
Chou
, J.-S.
Huang
, S.-M.
Lin
, and Y.-L.
Chueh
, Sci. Rep.
7
, 2066
(2017
).10.
N.
Shukla
, A. V.
Thathachary
, A.
Agrawal
, H.
Paik
, A.
Aziz
, D. G.
Schlom
, S. K.
Gupta
, R.
Engel-Herbert
, and S.
Datta
, Nat. Commun.
6
, 7812
(2015
).11.
J.
Park
, D.
Lee
, J.
Yoo
, and H.
Hwang
, “NbO2based threshold switch device with high operating temperature (>85 °C) for steep-slope MOSFET (∼2mV/dec) with ultra-low voltage operation and improved delay time
,” in IEEE International Electron Devices Meeting (IEDM) (2017
).12.
M. D.
Pickett
, G.
Medeiros-Ribeiro
, and R. S.
Williams
, Nat. Mater.
12
, 114
(2013
).13.
S.
Kumar
, J. P.
Strachan
, and R. S.
Williams
, Nature
548
, 318
(2017
).14.
M.
Son
, J.
Lee
, J.
Park
, J.
Shin
, G.
Choi
, S.
Jung
, W.
Lee
, S.
Kim
, S.
Park
, and H.
Hwang
, IEEE Electron Device Lett.
32
, 1579
(2011
).15.
E.
Cha
, J.
Park
, J.
Woo
, D.
Lee
, A.
Prakash
, and H.
Hwang
, Appl. Phys. Lett.
108
, 153502
(2016
).16.
M.-J.
Lee
, D.
Lee
, S.-H.
Cho
, J.-H.
Hur
, S.-M.
Lee
, D. H.
Seo
, D.-S.
Kim
, M.-S.
Yang
, S.
Lee
, E.
Hwang
, M. R.
Uddin
, H.
Kim
, U. I.
Chung
, Y.
Park
, and I.-K.
Yoo
, Nat. Commun.
4
, 2629
(2013
).17.
A.
Velea
, K.
Opsomer
, W.
Devulder
, J.
Dumortier
, J.
Fan
, C.
Detavernier
, M.
Jurczak
, and B.
Govoreanu
, Sci. Rep.
7
, 8103
(2017
).18.
R. S.
Shenoy
, G. W.
Burr
, K.
Virwani
, B.
Jackson
, A.
Padilla
, P.
Narayanan
, C. T.
Rettner
, R. M.
Shelby
, D. S.
Bethune
, K. V.
Raman
, M.
BrightSky
, E.
Joseph
, P. M.
Rice
, T.
Topuria
, A. J.
Kellock
, B.
Kurdi
, and K.
Gopalakrishnan
, Semicond. Sci. Technol.
29
, 104005
(2014
).19.
K.
Gopalakrishnan
, R. S.
Shenoy
, C. T.
Rettner
, K.
Virwani
, D. S.
Bethune
, R. M.
Shelby
, G. W.
Burr
, A.
Kellock
, R. S.
King
, K.
Nguyen
, A. N.
Bowers
, M.
Jurich
, B.
Jackson
, A. M.
Friz
, T.
Topuria
, P. M.
Rice
, and B. N.
Kurdi
, Highly-scalable novel access device based on mixed ionic electronic conduction (MIEC) materials for high density phase change memory (PCM) arrays, in Symposium on VLSI Technology (VLSIT) (2010
), p. 205
.20.
S. H.
Jo
, T.
Kumar
, S.
Narayanan
, and H.
Nazarian
, IEEE Trans. Electron Devices
62
, 3477
(2015
).21.
A.
Chasin
, L.
Zhang
, A.
Bhoolokam
, M.
Nag
, S.
Steudel
, B.
Govoreanu
, G.
Gielen
, and P.
Heremans
, IEEE Electron Device Lett.
35
, 642
(2014
).22.
B. J.
Choi
, J.
Zhang
, K.
Norris
, G.
Gibson
, K. M.
Kim
, W.
Jackson
, M.-X. M.
Zhang
, Z.
Li
, J. J.
Yang
, and R. S.
Williams
, Adv. Mater.
28
, 356
(2016
).23.
Z.
Wang
, M.
Rao
, R.
Midya
, S.
Joshi
, H.
Jiang
, P.
Lin
, W.
Song
, S.
Asapu
, Y.
Zhuo
, C.
Li
, H.
Wu
, Q.
Xia
, and J. J.
Yang
, Adv. Funct. Mater.
28
, 1704862
(2018
).24.
R.
Midya
, Z.
Wang
, J.
Zhang
, S. E.
Savel'ev
, C.
Li
, M.
Rao
, M. H.
Jang
, S.
Joshi
, H.
Jiang
, P.
Lin
, K.
Norris
, N.
Ge
, Q.
Wu
, M.
Barnell
, Z.
Li
, H. L.
Xin
, R. S.
Williams
, Q.
Xia
, and J. J.
Yang
, Adv. Mater.
29
, 1604457
(2017
).25.
T.
Liu
, M.
Verma
, Y.
Kang
, and M.
Orlowski
, Appl. Phys. Lett.
101
, 073510
(2012
).26.
W.
Chen
, H. J.
Barnaby
, and M. N.
Kozicki
, IEEE Electron Device Lett.
37
, 580
(2016
).27.
U.-B.
Han
, D.
Lee
, and J.-S.
Lee
, NPG Asia Mater.
9
, e351
(2017
).28.
J.
Song
, A.
Prakash
, D.
Lee
, J.
Woo
, E.
Cha
, S.
Lee
, and H.
Hwang
, Appl. Phys. Lett.
107
, 113504
(2015
).29.
J. Y.
Kim
, J. A.
Rodriguez
, J. C.
Hanson
, A. I.
Frenkel
, and P. L.
Lee
, J. Am. Chem. Soc.
125
, 10684
(2003
).30.
K.-D.
Liang
, C.-H.
Huang
, C.-C.
Lai
, J.-S.
Huang
, H.-W.
Tsai
, Y.-C.
Wang
, Y.-C.
Shih
, M.-T.
Chang
, S.-C.
Lo
, and Y.-L.
Chueh
, ACS Appl. Mater. Interfaces
6
, 16537
(2014
).31.
X.
Jiang
, T.
Herricks
, and Y.
Xia
, Nano Lett.
2
, 1333
(2002
).32.
L.
Liao
, B.
Yan
, Y. F.
Hao
, G. Z.
Xing
, J. P.
Liu
, B. C.
Zhao
, Z. X.
Shen
, T.
Wu
, L.
Wang
, J. T. L.
Thong
, C. M.
Li
, W.
Huang
, and T.
Yu
, Appl. Phys. Lett.
94
, 113106
(2009
).33.
Y.-S.
Hong
, J.-Y.
Chen
, C.-W.
Huang
, C.-H.
Chiu
, Y.-T.
Huang
, T. K.
Huang
, R. S.
He
, and W.-W.
Wu
, Appl. Phys. Lett.
106
, 173103
(2015
).34.
C.-P.
Hsiung
, H.-W.
Liao
, J.-Y.
Gan
, T.-B.
Wu
, J.-C.
Hwang
, F.
Chen
, and M.-J.
Tsai
, ACS Nano
4
, 5414
(2010
).© 2020 Author(s).
2020
Author(s)
You do not currently have access to this content.