We report the observation of substitutional silicon atoms in single-layer hexagonal boron nitride (h-BN) using aberration corrected scanning transmission electron microscopy. The images reveal silicon atoms exclusively filling boron vacancies. Density functional theory is used to study the energetics, structure, and properties of the experimentally observed structure. The formation energies reveal as the most stable configuration. In this case, the silicon atom elevates by 0.66 Å out of the lattice with unoccupied defect levels in the electronic bandgap above the Fermi level. Our results unequivocally show that heteroatoms can be incorporated into the h-BN lattice opening the way for applications ranging from single-atom catalysis to atomically precise magnetic structures.
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12 August 2019
Research Article|
August 16 2019
Substitutional Si impurities in monolayer hexagonal boron nitride
Mohammad Reza Ahmadpour Monazam
;
Mohammad Reza Ahmadpour Monazam
a)
1
Faculty of Physics, University of Vienna
, Boltzmanngasse 5, A-1090 Vienna, Austria
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Ursula Ludacka;
Ursula Ludacka
1
Faculty of Physics, University of Vienna
, Boltzmanngasse 5, A-1090 Vienna, Austria
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Hannu-Pekka Komsa
;
Hannu-Pekka Komsa
2
Department of Applied Physics, Aalto University
, P.O. Box 11100, 00076 Aalto, Finland
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Jani Kotakoski
Jani Kotakoski
1
Faculty of Physics, University of Vienna
, Boltzmanngasse 5, A-1090 Vienna, Austria
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a)
Electronic mail: [email protected]
Appl. Phys. Lett. 115, 071604 (2019)
Article history
Received:
June 06 2019
Accepted:
July 16 2019
Citation
Mohammad Reza Ahmadpour Monazam, Ursula Ludacka, Hannu-Pekka Komsa, Jani Kotakoski; Substitutional Si impurities in monolayer hexagonal boron nitride. Appl. Phys. Lett. 12 August 2019; 115 (7): 071604. https://doi.org/10.1063/1.5112375
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