Homogeneous penetration of atmospheric pressure uniform air plasma (APUAP) into thin gaps is highly warranted for multipurpose processing of materials. Here, we report APUAP generation in a 7 mm discharge gap with ambient air as the working gas, well beyond the presently maximum achievable 4 mm. Driven by a short pulse high voltage power, a 7 mm wide and 60 mm long uniform air plasma sheet is generated. The discharge is robust and the uniformity is not affected by the complex and variable components of ambient air, as is the case for most plasma discharges in air. Ultrafast photography shows that, different from previous reports, the discharge initiates in the whole air gap simultaneously and brightens quickly with the fast rise of the pulsed voltage. The generation of uniform plasma is mainly attributed to the high density of seed electrons and the reduced number density of molecules in air. Moreover, the achievable gas temperature of up to 1300 K indicates that this type of plasma is suitable for processing of a broad range of materials.

1.
B. M.
Hare
,
O.
Scholten
,
J.
Dwyer
,
T. N. G.
Trinh
,
S.
Buitink
,
S.
ter Veen
,
A.
Bonardi
,
A.
Corstanje
,
H.
Falcke
,
J. R.
Hörandel
,
T.
Huege
,
P.
Mitra
,
K.
Mulrey
,
A.
Nelles
,
J. P.
Rachen
,
L.
Rossetto
,
P.
Schellart
,
T.
Winchen
,
J.
Anderson
,
I. M.
Avruch
,
M. J.
Bentum
,
R.
Blaauw
,
J. W.
Broderick
,
W. N.
Brouw
,
M.
Brüggen
,
H. R.
Butcher
,
B.
Ciardi
,
R. A.
Fallows
,
E.
de Geus
,
S.
Duscha
,
J.
Eislöffel
,
M. A.
Garrett
,
J. M.
Grießmeier
,
A. W.
Gunst
,
M. P.
van Haarlem
,
J. W. T.
Hessels
,
M.
Hoeft
,
A. J.
van der Horst
,
M.
Iacobelli
,
L. V. E.
Koopmans
,
A.
Krankowski
,
P.
Maat
,
M. J.
Norden
,
H.
Paas
,
M.
Pandey-Pommier
,
V. N.
Pandey
,
R.
Pekal
,
R.
Pizzo
,
W.
Reich
,
H.
Rothkaehl
,
H. J. A.
Röttgering
,
A.
Rowlinson
,
D. J.
Schwarz
,
A.
Shulevski
,
J.
Sluman
,
O.
Smirnov
,
M.
Soida
,
M.
Tagger
,
M. C.
Toribio
,
A.
van Ardenne
,
R. A. M. J.
Wijers
,
R. J.
van Weeren
,
O.
Wucknitz
,
P.
Zarka
, and
P.
Zucca
,
Nature
568
(
7752
),
360
363
(
2019
).
2.
H.
Xu
,
Y.
He
,
K. L.
Strobel
,
C. K.
Gilmore
,
S. P.
Kelley
,
C. C.
Hennick
,
T.
Sebastian
,
M. R.
Woolston
,
D. J.
Perreault
, and
S. R. H.
Barrett
,
Nature
563
(
7732
),
532
535
(
2018
).
3.
S.
Dou
,
L.
Tao
,
R.
Wang
,
S.
El Hankari
,
R.
Chen
, and
S.
Wang
,
Adv. Mater.
30
(
21
),
1705850
(
2018
).
4.
R.
Ben Gadri
,
J. R.
Roth
,
T. C.
Montie
,
K.
Kelly-Wintenberg
,
P. P. Y.
Tsai
,
D. J.
Helfritch
,
P.
Feldman
,
D. M.
Sherman
,
F.
Karakaya
,
Z. Y.
Chen
, and
U. T. K. P. S.
Team
,
Surf. Coat. Technol.
131
(
1–3
),
528
542
(
2000
).
5.
R. W.
Zhou
,
R. S.
Zhou
,
F.
Yu
,
D. K.
Xi
,
P. Y.
Wang
,
J. W.
Li
,
X. Q.
Wang
,
X. H.
Zhang
,
K.
Bazaka
, and
K.
Ostrikov
,
Chem. Eng. J.
342
,
401
409
(
2018
).
6.
P.
Dimitrakellis
,
A.
Zeniou
,
Y.
Stratakos
, and
E.
Gogolides
,
Plasma Sources Sci. Technol.
25
(
2
),
025015
(
2016
).
7.
X. C.
Li
,
W. T.
Bao
,
P. Y.
Jia
,
H. H.
Zhao
,
C.
Di
, and
J. Y.
Chen
,
Chin. Phys. B
23
(
9
),
095202
(
2014
).
8.
Z.
Fang
,
X.
Xie
,
J.
Li
,
H.
Yang
,
Y.
Qiu
, and
E.
Kuffel
,
J. Phys. D: Appl. Phys.
42
(
8
),
085204
(
2009
).
9.
J. R.
Roth
,
S.
Nourgostar
, and
T. A.
Bonds
,
IEEE Trans. Plasma Sci.
35
(
2
),
233
250
(
2007
).
10.
I.
Alexeff
and
M.
Laroussi
,
IEEE Trans. Plasma Sci.
30
(
1
),
174
175
(
2002
).
11.
M.
Hur
,
W. S.
Kang
, and
Y. H.
Song
,
Plasma Chem. Plasma Process.
33
(
1
),
115
129
(
2013
).
12.
S.
Zhang
,
L.
Jia
,
W. C.
Wang
,
D. Z.
Yang
,
K.
Tang
, and
Z. J.
Liu
,
Spectrochim. Acta, Part A
117
,
535
540
(
2014
).
13.
Y. H.
Han
,
P. Y.
Jia
,
S. J.
He
, and
Z. S.
Zhang
,
Spectrosc. Spectral Anal.
35
(
10
),
2703
2707
(
2015
).
14.
Y. H.
Zhang
,
W. J.
Ning
, and
D.
Dai
,
J. Phys. D: Appl. Phys.
52
(
4
),
045203
(
2019
).
15.
C.
Zhang
,
T.
Shao
,
Y.
Zhou
,
Z.
Fang
,
P.
Yan
, and
Y.
Wenjin
,
Appl. Phys. Lett.
105
,
044102
(
2014
).
16.
X.-X.
Wang
,
M.-Z.
Lu
, and
Y.-K.
Pu
,
Acta Phys. Sin.
51
(
12
),
2778
(
2002
).
17.
H. Y.
Luo
,
K.
Liu
,
J. X.
Ran
,
Y.
Yue
,
X. X.
Wang
,
S.
Yap
, and
C. S.
Wong
,
IEEE Trans. Plasma Sci.
42
(
5
),
1211
1215
(
2014
).
18.
D. Z.
Yang
,
Y.
Yang
,
S. Z.
Li
,
D. X.
Nie
,
S.
Zhang
, and
W. C.
Wang
,
Plasma Sources Sci. Technol.
21
(
3
),
035004
(
2012
).
19.
X.
Lu
,
J. Appl. Phys.
102
(
3
),
033302
(
2007
).
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