We study the femtosecond carrier dynamics of n-type doped and biaxially strained Ge-on-Si films which occurs upon impulsive photoexcitation by means of broadband near-IR transient absorption spectroscopy. The modeling of the experimental data takes into account the static donor density in a modified rate equation for the description of the temporal recombination dynamics. The measurements confirm the negligible contribution at a high n-type doping concentration, in the 1019 cm−3 range, of Auger processes as compared to defect-related Shockley-Read-Hall recombination. Energy resolved dynamics reveal further insights into the doping-related band structure changes and suggest a reshaping of direct and indirect conduction band valleys to a single effective valley along with a significant spectral broadening of the optical transitions.
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17 June 2019
Research Article|
June 20 2019
Ultrafast carrier recombination in highly n-doped Ge-on-Si films
J. Allerbeck
;
J. Allerbeck
1
Department of Physics, University of Konstanz
, D-78457 Konstanz, Germany
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A. J. Herbst;
A. J. Herbst
1
Department of Physics, University of Konstanz
, D-78457 Konstanz, Germany
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Y. Yamamoto;
Y. Yamamoto
2
IHP—Leibniz-Institut für innovative Mikroelektronik
, Im Technologiepark 25, D-15236 Frankfurt (Oder), Germany
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G. Capellini
;
G. Capellini
2
IHP—Leibniz-Institut für innovative Mikroelektronik
, Im Technologiepark 25, D-15236 Frankfurt (Oder), Germany
3
Dipartimento di Scienze, Università di Roma Tre
, V.le G Marconi 446, I-00146 Roma, Italy
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M. Virgilio
;
M. Virgilio
4
Dipartimento di Fisica “E. Fermi,” Università di Pisa
, Largo Pontecorvo 3, I-56127 Pisa, Italy
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D. Brida
D. Brida
a)
1
Department of Physics, University of Konstanz
, D-78457 Konstanz, Germany
5
Physics and Materials Science Research Unit, University of Luxembourg
, 162a avenue de la Faïencerie, L-1511 Luxembourg, Luxembourg
a)Author to whom correspondence should be addressed: daniele.brida@uni.lu
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a)Author to whom correspondence should be addressed: daniele.brida@uni.lu
Appl. Phys. Lett. 114, 241104 (2019)
Article history
Received:
January 07 2019
Accepted:
June 07 2019
Citation
J. Allerbeck, A. J. Herbst, Y. Yamamoto, G. Capellini, M. Virgilio, D. Brida; Ultrafast carrier recombination in highly n-doped Ge-on-Si films. Appl. Phys. Lett. 17 June 2019; 114 (24): 241104. https://doi.org/10.1063/1.5088012
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