The application of transition metal dichalcogenides in optoelectronic, photonic, or valleytronic devices requires the growth of continuous monolayers, heterostructures, and alloys of different materials in a single process. We present a facile pulsed thermal deposition method which provides precise control over the number of layers and the composition of two-dimensional systems. The versatility of the method is demonstrated on ternary monolayers of Mo1−xWxS2 and on heterostructures combining metallic TaS2 and semiconducting MoS2 layers. The fabricated ternary monolayers cover the entire composition range of x = 0…1 without phase separation. Bandgap engineering and control over the spin–orbit coupling strength are demonstrated by absorption and photoluminescence spectroscopy. Vertical heterostructures are grown without intermixing. The formation of clean and atomically abrupt interfaces is evidenced by high-resolution transmission electron microscopy. Since both the metal components and the chalcogen are thermally evaporated, complex alloys and heterostructures can thus be prepared.
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Pulsed thermal deposition of binary and ternary transition metal dichalcogenide monolayers and heterostructures
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22 April 2019
Research Article|
April 22 2019
Pulsed thermal deposition of binary and ternary transition metal dichalcogenide monolayers and heterostructures
Niklas Mutz;
Niklas Mutz
1
Institut für Physik, Institut für Chemie and IRIS Adlershof, Humboldt-Universität zu Berlin
, Brook-Taylor-Str. 6, 12489 Berlin, Germany
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Tino Meisel;
Tino Meisel
2
Institut für Physik, Humboldt-Universität zu Berlin
, Newtonstr. 15, 12489 Berlin, Germany
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Holm Kirmse;
Holm Kirmse
2
Institut für Physik, Humboldt-Universität zu Berlin
, Newtonstr. 15, 12489 Berlin, Germany
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Soohyung Park
;
Soohyung Park
3
Institut für Physik and IRIS Adlershof, Humboldt-Universität zu Berlin
, Brook-Taylor-Str. 6, 12489 Berlin, Germany
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Nikolai Severin;
Nikolai Severin
4
Institut für Physik and IRIS Adlershof, Humboldt-Universität zu Berlin
, Newtonstr. 15, 12489 Berlin, Germany
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Jürgen P. Rabe
;
Jürgen P. Rabe
4
Institut für Physik and IRIS Adlershof, Humboldt-Universität zu Berlin
, Newtonstr. 15, 12489 Berlin, Germany
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Emil List-Kratochvil;
Emil List-Kratochvil
1
Institut für Physik, Institut für Chemie and IRIS Adlershof, Humboldt-Universität zu Berlin
, Brook-Taylor-Str. 6, 12489 Berlin, Germany
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Norbert Koch
;
Norbert Koch
3
Institut für Physik and IRIS Adlershof, Humboldt-Universität zu Berlin
, Brook-Taylor-Str. 6, 12489 Berlin, Germany
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Christoph T. Koch
;
Christoph T. Koch
4
Institut für Physik and IRIS Adlershof, Humboldt-Universität zu Berlin
, Newtonstr. 15, 12489 Berlin, Germany
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Sylke Blumstengel
;
Sylke Blumstengel
a)
1
Institut für Physik, Institut für Chemie and IRIS Adlershof, Humboldt-Universität zu Berlin
, Brook-Taylor-Str. 6, 12489 Berlin, Germany
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Sergey Sadofev
Sergey Sadofev
b)
2
Institut für Physik, Humboldt-Universität zu Berlin
, Newtonstr. 15, 12489 Berlin, Germany
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Appl. Phys. Lett. 114, 162101 (2019)
Article history
Received:
January 14 2019
Accepted:
April 03 2019
Citation
Niklas Mutz, Tino Meisel, Holm Kirmse, Soohyung Park, Nikolai Severin, Jürgen P. Rabe, Emil List-Kratochvil, Norbert Koch, Christoph T. Koch, Sylke Blumstengel, Sergey Sadofev; Pulsed thermal deposition of binary and ternary transition metal dichalcogenide monolayers and heterostructures. Appl. Phys. Lett. 22 April 2019; 114 (16): 162101. https://doi.org/10.1063/1.5088758
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