Peculiarities of plastic relaxation of (0001) InGaN epilayers and their consequences for pseudo-substrate application Available to Purchase

In this paper, we study the plastic relaxation of InGaN layers deposited on (0001) GaN bulk substrates and (0001) GaN/sapphire templates by molecular beam epitaxy. We demonstrate that the InGaN layers relax by the formation of (a+c)-type misfit dislocations gliding on pyramidal planes in the slip system ⟨11$2¯$3⟩{11$2¯$2} down to the interface where they form a trigonal dislocation network. Combining diffraction contrast and large angle convergent beam electron diffraction analyses performed using a transmission electron microscope, we reveal that all (a+c)-type dislocations belonging to one subset of the network exhibit Burgers vectors with the same c-component. This relaxation mechanism leads to partially relaxed InGaN layers with smooth surfaces and threading dislocation densities below 10⁹ cm⁻². Such layers are of potential interest as pseudo-substrates for the growth of InGaN heterostructures.