A free-electron laser (FEL) is a robust tool for studying the interaction of intense X-rays with matter. In this study, we investigate the damage threshold and morphology of fused silica irradiated by extreme ultraviolet femtosecond pulses of a FEL. The experimental results indicate the superiority of the FEL processing. The FEL-damage threshold of fused silica at a wavelength of 13.5 nm is 0.17 J/cm2, which is 20 times lower than that of a near infrared (NIR) femtosecond laser. The relationship between the crater depth and laser fluence reveals that the effective absorption length is αeff−1 = 58 nm. The damage threshold and the absorption length are the key values for smooth crater formation. In addition, the formation of rim structures and microcracks, which are usually the critical issues in NIR laser processing, cannot be found in the interaction region. The hole diameter is maintained below the beam size at the exit.
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22 October 2018
Research Article|
October 22 2018
Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses
Tatsunori Shibuya
;
Tatsunori Shibuya
a)
1
Research Institute for Measurement and Analytical Instrumentation (RIMA), National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST)
, 1-1-1 Umezono, Tsukuba 305-8568, Japan
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Takashi Takahashi;
Takashi Takahashi
2
Research Institute for Science and Engineering, Waseda University
, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
3
AIST-UTokyo Advanced Operando-Measurement Technology Open Innovation Laboratory (OPERANDO-OIL), National Institute of Advanced Industrial Science and Technology (AIST)
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8589, Japan
4
The Institute for Solid State Physics, The University of Tokyo
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8581, Japan
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Kazuyuki Sakaue;
Kazuyuki Sakaue
b)
2
Research Institute for Science and Engineering, Waseda University
, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
5Photon Science Center, Graduate School of Engineering,
The University of Tokyo
, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Thanh-Hung Dinh;
Thanh-Hung Dinh
6
Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology (QST)
, 8-1-7 Umemidai, Kizugawa, Kyoto 619-02 15, Japan
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Hiroyuki Hara;
Hiroyuki Hara
7
Department of Electrical and Electronic Engineering, Faculty of Engineering and Center for Optical Research and Education (CORE), Utsunomiya University
, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan
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Takeshi Higashiguchi;
Takeshi Higashiguchi
7
Department of Electrical and Electronic Engineering, Faculty of Engineering and Center for Optical Research and Education (CORE), Utsunomiya University
, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan
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Masahiko Ishino;
Masahiko Ishino
6
Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology (QST)
, 8-1-7 Umemidai, Kizugawa, Kyoto 619-02 15, Japan
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Yuya Koshiba;
Yuya Koshiba
2
Research Institute for Science and Engineering, Waseda University
, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
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Masaharu Nishikino;
Masaharu Nishikino
6
Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology (QST)
, 8-1-7 Umemidai, Kizugawa, Kyoto 619-02 15, Japan
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Hiroshi Ogawa;
Hiroshi Ogawa
1
Research Institute for Measurement and Analytical Instrumentation (RIMA), National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST)
, 1-1-1 Umezono, Tsukuba 305-8568, Japan
3
AIST-UTokyo Advanced Operando-Measurement Technology Open Innovation Laboratory (OPERANDO-OIL), National Institute of Advanced Industrial Science and Technology (AIST)
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8589, Japan
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Masahito Tanaka;
Masahito Tanaka
1
Research Institute for Measurement and Analytical Instrumentation (RIMA), National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST)
, 1-1-1 Umezono, Tsukuba 305-8568, Japan
3
AIST-UTokyo Advanced Operando-Measurement Technology Open Innovation Laboratory (OPERANDO-OIL), National Institute of Advanced Industrial Science and Technology (AIST)
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8589, Japan
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Masakazu Washio;
Masakazu Washio
2
Research Institute for Science and Engineering, Waseda University
, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
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Yohei Kobayashi;
Yohei Kobayashi
3
AIST-UTokyo Advanced Operando-Measurement Technology Open Innovation Laboratory (OPERANDO-OIL), National Institute of Advanced Industrial Science and Technology (AIST)
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8589, Japan
4
The Institute for Solid State Physics, The University of Tokyo
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8581, Japan
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Ryunosuke Kuroda
Ryunosuke Kuroda
1
Research Institute for Measurement and Analytical Instrumentation (RIMA), National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST)
, 1-1-1 Umezono, Tsukuba 305-8568, Japan
3
AIST-UTokyo Advanced Operando-Measurement Technology Open Innovation Laboratory (OPERANDO-OIL), National Institute of Advanced Industrial Science and Technology (AIST)
, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8589, Japan
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Appl. Phys. Lett. 113, 171902 (2018)
Article history
Received:
June 26 2018
Accepted:
September 18 2018
Citation
Tatsunori Shibuya, Takashi Takahashi, Kazuyuki Sakaue, Thanh-Hung Dinh, Hiroyuki Hara, Takeshi Higashiguchi, Masahiko Ishino, Yuya Koshiba, Masaharu Nishikino, Hiroshi Ogawa, Masahito Tanaka, Masakazu Washio, Yohei Kobayashi, Ryunosuke Kuroda; Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses. Appl. Phys. Lett. 22 October 2018; 113 (17): 171902. https://doi.org/10.1063/1.5046125
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