The photocurrent (IPH) of amorphous InZnO thin film transistors in the off-state is investigated as a function of incident optical power (P). The results show that IPH exhibits a nonlinear dependence on P. Additionally, the dependence of IPH on P exhibits a strong photon energy (hυ)-dependent feature. When P is relatively low, IPH is shown to be proportional to Pγ, where γ is greater than 1. The γ > 1 behavior may be ascribed to the source-barrier-lowering effect due to the accumulation of photo-induced positive charges at the source side. When P is relatively high, while IPH remains proportional to Pγ under the incident light with hυ larger than the optical bandgap (Eg) of a-IZO, it turns to increase at an exponential rate with P if hυ of the incident light is smaller than the Eg. The exponential increase in IPH is attributed to the source-barrier-thinning effect, which leads to a significantly enhanced tunneling current.
Skip Nav Destination
Article navigation
22 January 2018
Research Article|
January 24 2018
Nonlinear photocurrent-intensity behavior of amorphous InZnO thin film transistors
Huiling Lu;
Huiling Lu
1
School of Electronic and Computer Engineering, Peking University
, Shenzhen 518055, China
Search for other works by this author on:
Xiaoliang Zhou
;
Xiaoliang Zhou
2
Institute of Microelectronics, Peking University
, Beijing 100871, China
Search for other works by this author on:
Ting Liang;
Ting Liang
1
School of Electronic and Computer Engineering, Peking University
, Shenzhen 518055, China
Search for other works by this author on:
Letao Zhang;
Letao Zhang
1
School of Electronic and Computer Engineering, Peking University
, Shenzhen 518055, China
Search for other works by this author on:
Shengdong Zhang
Shengdong Zhang
a)
1
School of Electronic and Computer Engineering, Peking University
, Shenzhen 518055, China
2
Institute of Microelectronics, Peking University
, Beijing 100871, China
Search for other works by this author on:
a)
Author to whom correspondence should be addressed: zhangsd@pku.edu.cn
Appl. Phys. Lett. 112, 042103 (2018)
Article history
Received:
November 01 2017
Accepted:
January 09 2018
Citation
Huiling Lu, Xiaoliang Zhou, Ting Liang, Letao Zhang, Shengdong Zhang; Nonlinear photocurrent-intensity behavior of amorphous InZnO thin film transistors. Appl. Phys. Lett. 22 January 2018; 112 (4): 042103. https://doi.org/10.1063/1.5011687
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Sign in via your Institution
Sign in via your InstitutionPay-Per-View Access
$40.00