In this study, we report that the carrier mobility of 2%-La-doped BaSnO3 (LBSO) films on (001) SrTiO3 and (001) MgO substrates strongly depends on the thickness, whereas it is unrelated to the film/substrate lattice mismatch (+5.4% for SrTiO3 and −2.3% for MgO). The films exhibited large differences in lattice parameters, lateral grain sizes (∼85 nm for SrTiO3 and ∼20 nm for MgO), surface morphologies, threading dislocation densities, and misfit dislocation densities. However, the mobility dependences on the film thickness in both cases were almost the same, saturating at ∼100 cm2 V−1 s−1, while the charge carrier densities approached the nominal carrier concentration (=[2% La3+]). Our study clearly indicates that the carrier mobility of LBSO films strongly depends on the thickness. These results would be beneficial for understanding the carrier transport properties and fruitful to further enhance the mobility of LBSO films.
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4 June 2018
Research Article|
June 06 2018
Large thickness dependence of the carrier mobility in a transparent oxide semiconductor, La-doped BaSnO3
Anup V. Sanchela;
Anup V. Sanchela
a)
1
Research Institute for Electronic Science, Hokkaido University
, N20W10, Kita, Sapporo 001-0020, Japan
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Mian Wei;
Mian Wei
2
Graduate School of Information Science and Technology, Hokkaido University
, N14W9, Kita, Sapporo 060-0814, Japan
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Haruki Zensyo;
Haruki Zensyo
3
School of Engineering, Hokkaido University
, N14W9, Kita, Sapporo 060-0814, Japan
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Bin Feng
;
Bin Feng
4
Institute of Engineering Innovation, The University of Tokyo
, 2-11-16 Yayoi, Bunkyo, Tokyo 113-8656, Japan
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Joonhyuk Lee;
Joonhyuk Lee
5
Department of Physics, Pusan National University
, Busan 46241, South Korea
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Gowoon Kim;
Gowoon Kim
5
Department of Physics, Pusan National University
, Busan 46241, South Korea
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Hyoungjeen Jeen;
Hyoungjeen Jeen
5
Department of Physics, Pusan National University
, Busan 46241, South Korea
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Yuichi Ikuhara;
Yuichi Ikuhara
4
Institute of Engineering Innovation, The University of Tokyo
, 2-11-16 Yayoi, Bunkyo, Tokyo 113-8656, Japan
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Hiromichi Ohta
Hiromichi Ohta
a)
1
Research Institute for Electronic Science, Hokkaido University
, N20W10, Kita, Sapporo 001-0020, Japan
2
Graduate School of Information Science and Technology, Hokkaido University
, N14W9, Kita, Sapporo 060-0814, Japan
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Appl. Phys. Lett. 112, 232102 (2018)
Article history
Received:
April 04 2018
Accepted:
May 14 2018
Citation
Anup V. Sanchela, Mian Wei, Haruki Zensyo, Bin Feng, Joonhyuk Lee, Gowoon Kim, Hyoungjeen Jeen, Yuichi Ikuhara, Hiromichi Ohta; Large thickness dependence of the carrier mobility in a transparent oxide semiconductor, La-doped BaSnO3. Appl. Phys. Lett. 4 June 2018; 112 (23): 232102. https://doi.org/10.1063/1.5033326
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