Deep depletion concept for diamond MOSFET

A stable deep depletion regime is demonstrated in metal oxide semiconductor capacitors using $p$-type oxygen-terminated (100) diamond as a semiconductor and Al₂O₃ deposited by Atomic Layer Deposition at 380 °C. Current voltage I(V) and capacitance voltage C(V) measurements were performed to evaluate the effectiveness of diamond semiconductor gate control. An effective modulation of the space charge region width is obtained by the gate bias, where the deep depletion regime is demonstrated for a positive gate bias. The deep depletion concept is described and proposed for MOSFET devices. Finally, a proof of concept of diamond deep depletion MOSFETs is presented.