The realization of silicene-free ZrB2(0001) thin films grown on Si(111) by ion bombardment allowed for studying the spontaneous formation of silicene on their surfaces. Imaging the bare ZrB2(0001) surface by STM revealed the structures of Zr-terminated and B-terminated ZrB2(0001) created by the bombardment. The spontaneous formation of a continuous silicene sheet on a sputtering-induced disordered ZrB2 surface demonstrates that silicene does not require an atomically-flat crystalline template to be stabilized. This opens the way to the fabrication of large scale single-crystal sheets and points out the potential of silicene to be used in the next generation silicon-based technologies.
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Research Article| January 23 2017
Insights into the spontaneous formation of silicene sheet on diboride thin films
A. Fleurence, Y. Yamada-Takamura; Insights into the spontaneous formation of silicene sheet on diboride thin films. Appl. Phys. Lett. 23 January 2017; 110 (4): 041601. https://doi.org/10.1063/1.4974467
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