We report an interband tunneling field effect transistor (TFET) integrated with a Black Phosphorus (BP)-MoS2 junction and ion gel as a top gate dielectric. The operation of the BP-MOS2 TFET is based on the modulation of the energy band alignment of the BP-MoS2 junction with electrostatic gating control on the MoS2 channel from the top gate through the ion gel dielectric and the supply of tunneling carriers from the BP source, which is degenerately doped with ion gel. The obtained subthreshold swing of the BP-MoS2 TFET reached 65 mV/dec at room temperature and 51 mV/dec at 160 K, maintaining low SS values in more than 2 orders of drain current range. The demonstrated interband TFET based on the BP-MoS2 junction shows significant promise for further application to a new class of two-dimensional functional devices.
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16 January 2017
Research Article|
January 18 2017
Tunneling field effect transistor integrated with black phosphorus-MoS2 junction and ion gel dielectric Available to Purchase
Jiao Xu;
Jiao Xu
1SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
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Jingyuan Jia;
Jingyuan Jia
1SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
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Shen Lai;
Shen Lai
1SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
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Jaehyuk Ju;
Jaehyuk Ju
1SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
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Sungjoo Lee
Sungjoo Lee
a)
1SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
2School of Electronic and Electrical Engineering,
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
Search for other works by this author on:
Jiao Xu
1
Jingyuan Jia
1
Shen Lai
1
Jaehyuk Ju
1
Sungjoo Lee
1,2,a)
1SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
2School of Electronic and Electrical Engineering,
Sungkyunkwan University (SKKU)
, Suwon, 440-746, South Korea
a)
Author to whom correspondence should be addressed. Electronic mail: [email protected]
Appl. Phys. Lett. 110, 033103 (2017)
Article history
Received:
November 10 2016
Accepted:
January 06 2017
Citation
Jiao Xu, Jingyuan Jia, Shen Lai, Jaehyuk Ju, Sungjoo Lee; Tunneling field effect transistor integrated with black phosphorus-MoS2 junction and ion gel dielectric. Appl. Phys. Lett. 16 January 2017; 110 (3): 033103. https://doi.org/10.1063/1.4974303
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