The temperature evolution of spin relaxation time, τsf, in degenerate silicon (Si)-based lateral spin valves is investigated by means of the Hanle effect measurements. τsf at 300 K is estimated to be 1.68 ± 0.03 ns and monotonically increased with decreasing temperature down to 100 K. Below 100 K, in contrast, it shows almost a constant value of ca. 5 ns. The temperature dependence of the conductivity of the Si channel shows a similar behavior to that of the τsf, i.e., monotonically increasing with decreasing temperature down to 100 K and a weak temperature dependence below 100 K. The temperature evolution of conductivity reveals that electron scattering due to magnetic impurities is negligible. A comparison between τsf and momentum scattering time reveals that the dominant spin scattering mechanism in the Si is the Elliott-Yafet mechanism, and the ratio of the momentum scattering time to the τsf attributed to nonmagnetic impurities is approximately 3.77 × 10−6, which is more than two orders of magnitude smaller than that of copper.
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8 May 2017
Research Article|
May 08 2017
Investigation of spin scattering mechanism in silicon channels of Fe/MgO/Si lateral spin valves
Soobeom Lee;
Soobeom Lee
1Department of Electronic Science and Engineering,
Kyoto University
, Kyoto, Kyoto 615-8510, Japan
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Naoto Yamashita;
Naoto Yamashita
1Department of Electronic Science and Engineering,
Kyoto University
, Kyoto, Kyoto 615-8510, Japan
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Yuichiro Ando;
Yuichiro Ando
a)
1Department of Electronic Science and Engineering,
Kyoto University
, Kyoto, Kyoto 615-8510, Japan
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Shinji Miwa
;
Shinji Miwa
2Graduate School of Engineering Science,
Osaka University
, Toyonaka, Osaka 560-8531, Japan
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Yoshishige Suzuki;
Yoshishige Suzuki
2Graduate School of Engineering Science,
Osaka University
, Toyonaka, Osaka 560-8531, Japan
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Hayato Koike;
Hayato Koike
3
Technology HQ
, TDK Corporation, Ichikawa, Chiba 272-8558, Japan
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Masashi Shiraishi
Masashi Shiraishi
a)
1Department of Electronic Science and Engineering,
Kyoto University
, Kyoto, Kyoto 615-8510, Japan
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a)
Authors to whom correspondence should be addressed. Electronic addresses: [email protected] and [email protected]
Appl. Phys. Lett. 110, 192401 (2017)
Article history
Received:
January 20 2017
Accepted:
April 18 2017
Citation
Soobeom Lee, Naoto Yamashita, Yuichiro Ando, Shinji Miwa, Yoshishige Suzuki, Hayato Koike, Masashi Shiraishi; Investigation of spin scattering mechanism in silicon channels of Fe/MgO/Si lateral spin valves. Appl. Phys. Lett. 8 May 2017; 110 (19): 192401. https://doi.org/10.1063/1.4982966
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