Piezo-Hall effect in a single crystal p-type 3C-SiC, grown by LPCVD process, has been characterized for various crystallographic orientations. The quantified values of the piezo-Hall effect in heavily doped p-type 3C-SiC(100) and 3C-SiC(111) for different crystallographic orientations were used to obtain the fundamental piezo-Hall coefficients, , and . Unlike the piezoresistive effect, the piezo-Hall effect for (100) and (111) planes is found to be independent of the angle of rotation of the device within the crystal plane. The values of fundamental piezo-Hall coefficients obtained in this study can be used to predict the piezo-Hall coefficients in any crystal orientation which is very important for designing of 3C-SiC Hall sensors to minimize the piezo-Hall effect for stable magnetic field sensitivity.
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29 August 2016
Research Article|
August 30 2016
Fundamental piezo-Hall coefficients of single crystal p-type 3C-SiC for arbitrary crystallographic orientation
Afzaal Qamar
;
Afzaal Qamar
a)
1Queensland Micro- and Nanotechnology Centre,
Griffith University
, Queensland 4111, Australia
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Dzung Viet Dao;
Dzung Viet Dao
1Queensland Micro- and Nanotechnology Centre,
Griffith University
, Queensland 4111, Australia
2School of Engineering,
Griffith University
, Queensland 4222, Australia
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Hoang-Phuong Phan;
Hoang-Phuong Phan
1Queensland Micro- and Nanotechnology Centre,
Griffith University
, Queensland 4111, Australia
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Toan Dinh;
Toan Dinh
1Queensland Micro- and Nanotechnology Centre,
Griffith University
, Queensland 4111, Australia
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Sima Dimitrijev
Sima Dimitrijev
1Queensland Micro- and Nanotechnology Centre,
Griffith University
, Queensland 4111, Australia
2School of Engineering,
Griffith University
, Queensland 4222, Australia
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a)
Electronic mail: afzaal.qamar@griffithuni.edu.au
Appl. Phys. Lett. 109, 092903 (2016)
Article history
Received:
June 19 2016
Accepted:
August 19 2016
Citation
Afzaal Qamar, Dzung Viet Dao, Hoang-Phuong Phan, Toan Dinh, Sima Dimitrijev; Fundamental piezo-Hall coefficients of single crystal p-type 3C-SiC for arbitrary crystallographic orientation. Appl. Phys. Lett. 29 August 2016; 109 (9): 092903. https://doi.org/10.1063/1.4962048
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