Graphene nanostructures are potential building blocks for nanoelectronic and spintronic devices. However, the production of monolayer graphene nanostructures with well-defined zigzag edges remains a challenge. In this paper, we report the patterning of monolayer graphene nanostructures with zigzag edges on hexagonal boron nitride (h-BN) substrates by an anisotropic etching technique. We found that hydrogen plasma etching of monolayer graphene on h-BN is highly anisotropic due to the inert and ultra-flat nature of the h-BN surface, resulting in zigzag edge formation. The as-fabricated zigzag-edged monolayer graphene nanoribbons (Z-GNRs) with widths below 30 nm show high carrier mobility and width-dependent energy gaps at liquid helium temperature. These high quality Z-GNRs are thus ideal structures for exploring their valleytronic or spintronic properties.
Patterning monolayer graphene with zigzag edges on hexagonal boron nitride by anisotropic etching
Guole Wang, Shuang Wu, Tingting Zhang, Peng Chen, Xiaobo Lu, Shuopei Wang, Duoming Wang, Kenji Watanabe, Takashi Taniguchi, Dongxia Shi, Rong Yang, Guangyu Zhang; Patterning monolayer graphene with zigzag edges on hexagonal boron nitride by anisotropic etching. Appl. Phys. Lett. 1 August 2016; 109 (5): 053101. https://doi.org/10.1063/1.4959963
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