We present a method for improving the lithographic resolution of digital micromirror devices for flow-lithography using a wobulation technique. While maintaining the area of UV exposure, the lithographic resolution was improved using a wobulation technique, which is a large screen display technique that enhances resolution via overlapping pixels by half a pixel. The edges of a diagonal pattern in a microstructure were smoothly generated with additional sub-patterns compared to conventional single pattern-exposure. In addition, the surface roughness of the microstructure was improved because the gaps between pixels were filled by the overlapping patterns.

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