We study low-temperature transport properties of two-dimensional (2D) Si tunnel diodes, or Si Esaki diodes, with a lateral layout. In ordinary Si Esaki diodes, interband tunneling current is severely limited because of the law of momentum conservation, while nanoscale Esaki diodes may behave differently due to the dopants in the narrow depletion region, by atomistic effects which release such current limitation. In thin-Si lateral highly doped pn diodes, we find clear signatures of interband tunneling between 2D-subbands involving phonon assistance. More importantly, the tunneling current is sharply enhanced in a narrow voltage range by resonance via a pair of a donor- and an acceptor-atom in the pn junction region. Such atomistic behavior is recognized as a general feature showing up only in nanoscale tunnel diodes. In particular, a donor-acceptor pair with deeper ground-state energies is likely to be responsible for such a sharply enhanced current peak, tunable by external biases.
Skip Nav Destination
,
,
,
,
,
,
,
Article navigation
29 February 2016
Research Article|
March 03 2016
Atomistic nature in band-to-band tunneling in two-dimensional silicon pn tunnel diodes Available to Purchase
Michiharu Tabe;
Michiharu Tabe
a)
1Research Institute of Electronics,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
Search for other works by this author on:
Hoang Nhat Tan;
Hoang Nhat Tan
1Research Institute of Electronics,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
Search for other works by this author on:
Takeshi Mizuno;
Takeshi Mizuno
1Research Institute of Electronics,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
Search for other works by this author on:
Manoharan Muruganathan;
Manoharan Muruganathan
2School of Materials Science,
Japan Advanced Institute of Science and Technology
, 1-1 Asahidai, Nomi 923-1292, Japan
Search for other works by this author on:
Le The Anh
;
Le The Anh
2School of Materials Science,
Japan Advanced Institute of Science and Technology
, 1-1 Asahidai, Nomi 923-1292, Japan
Search for other works by this author on:
Hiroshi Mizuta;
Hiroshi Mizuta
2School of Materials Science,
Japan Advanced Institute of Science and Technology
, 1-1 Asahidai, Nomi 923-1292, Japan
3Nanoelectronics and Nanotechnologies Research Group, Faculty of Physical Sciences and Engineering,
University of Southampton
, High field, Southampton SO17 1BJ, United Kingdom
Search for other works by this author on:
Ratno Nuryadi;
Ratno Nuryadi
1Research Institute of Electronics,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
4Center for Materials Technology,
Agency for the Assessment and Application of Technology
, South Tangerang, Indonesia
Search for other works by this author on:
Daniel Moraru
Daniel Moraru
1Research Institute of Electronics,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
5Faculty of Engineering,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561, Japan
Search for other works by this author on:
Michiharu Tabe
1,a)
Hoang Nhat Tan
1
Takeshi Mizuno
1
Manoharan Muruganathan
2
Le The Anh
2
Hiroshi Mizuta
2,3
Ratno Nuryadi
1,4
Daniel Moraru
1,5
1Research Institute of Electronics,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
2School of Materials Science,
Japan Advanced Institute of Science and Technology
, 1-1 Asahidai, Nomi 923-1292, Japan
3Nanoelectronics and Nanotechnologies Research Group, Faculty of Physical Sciences and Engineering,
University of Southampton
, High field, Southampton SO17 1BJ, United Kingdom
4Center for Materials Technology,
Agency for the Assessment and Application of Technology
, South Tangerang, Indonesia
5Faculty of Engineering,
Shizuoka University
, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561, Japan
Appl. Phys. Lett. 108, 093502 (2016)
Article history
Received:
January 12 2016
Accepted:
February 19 2016
Citation
Michiharu Tabe, Hoang Nhat Tan, Takeshi Mizuno, Manoharan Muruganathan, Le The Anh, Hiroshi Mizuta, Ratno Nuryadi, Daniel Moraru; Atomistic nature in band-to-band tunneling in two-dimensional silicon pn tunnel diodes. Appl. Phys. Lett. 29 February 2016; 108 (9): 093502. https://doi.org/10.1063/1.4943094
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Attosecond physics and technology
O. Alexander, D. Ayuso, et al.
Significant improvement of breakdown voltage of Al0.86Ga0.14N Schottky barrier diodes by atomic layer etching
Tingang Liu, Zhiyuan Liu, et al.
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Related Content
Single-charge band-to-band tunneling via multiple-dopant clusters in nanoscale Si Esaki diodes
Appl. Phys. Lett. (June 2019)
Observation of strain in pseudomorphic Si 1 − x Ge x by tracking phonon participation in Si ∕ Si Ge resonant interband tunnel diodes via electron tunneling spectroscopy
J. Appl. Phys. (August 2009)
Tunneling between density-of-state tails: Theory and effect on Esaki diodes
J. Appl. Phys. (July 2020)
Benchmarking current density in staggered gap In0.53Ga0.47As/GaAs0.5Sb0.5 heterojunction Esaki tunnel diodes
Appl. Phys. Lett. (May 2013)
Excess and Hump Current in Esaki Diodes
J. Appl. Phys. (November 1961)