The ion flux is measured spatially resolved along the substrate surface in dual-frequency large area capacitive discharges operated in H2 at 150 Pa. One electrode is driven by 40.68 MHz and/or 81.36 MHz. The dependence of the ion flux profile on the applied voltage waveform is investigated experimentally and by a two-dimensional model. The results show that lateral inhomogeneities caused by standing wave effects can be eliminated based on the electrical asymmetry effect, i.e., by tuning the phase shift between the two applied frequencies. This approach solves one of the major problems in plasma processing of large substrates.
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