The influence of nonlinear frequency coupling in an oxygen plasma excited by two odd harmonics at moderate pressure is investigated using a numerical model. Through variations in the voltage ratio and phase shift between the frequency components changes in ionization dynamics and sheath voltages are demonstrated. Furthermore, a regime in which the voltage drop across the plasma sheath is minimised is identified. This regime provides a significantly higher ion flux than a single frequency discharge driven by the lower of the two frequencies alone. These operating parameters have potential to be exploited for plasma processes requiring low ion bombardment energies but high ion fluxes.
References
1.
H.
Goto
, H.-D.
Löwe
, and T.
Ohmi
, IEEE Trans. Semicond. Manuf.
6
, 58
(1993
).2.
T.
Kitajima
, Y.
Takeo
, Z. L.
Petrović
, and T.
Makabe
, Appl. Phys. Lett.
77
, 489
(2000
).3.
S. B.
Wang
and A. E.
Wendt
, J. Appl. Phys.
88
, 643
(2000
).4.
T.
Gans
, J.
Schulze
, D.
O'Connell
, U.
Czarnetzki
, R.
Faulkner
, A. R.
Ellingboe
, and M. M.
Turner
, Appl. Phys. Lett.
89
, 261502
(2006
).5.
B. G.
Heil
, U.
Czarnetzki
, R. P.
Brinkmann
, and T.
Mussenbrock
, J. Phys. D: Appl. Phys.
41
, 165202
(2008
).6.
Y.
Yang
and M. J.
Kushner
, Plasma Sources Sci. Technol.
19
, 055011
(2010
).7.
M. A.
Lieberman
, J. P.
Booth
, P.
Chabert
, J. M.
Rax
, and M. M.
Turner
, Plasma Sources Sci. Technol.
11
, 283
(2002
).8.
D.
Hrunski
, F.
Mootz
, A.
Zeuner
, A.
Janssen
, H.
Rost
, R.
Beckmann
, S.
Binder
, E.
Schüngel
, S.
Mohr
, D.
Luggenhölscher
et al, Vacuum
87
, 114
(2013
).9.
J.
Schulze
, T.
Gans
, D.
O'Connell
, U.
Czarnetzki
, A. R.
Ellingboe
, and M. M.
Turner
, J. Phys. D: Appl. Phys.
40
, 7008
(2007
).10.
D.
O'Connell
, T.
Gans
, E.
Semmler
, and P.
Awakowicz
, Appl. Phys. Lett.
93
, 081502
(2008
).11.
J.
Schulze
, A.
Derzsi
, and Z.
Donkó
, Plasma Sources Sci. Technol.
20
, 045008
(2011
).12.
E.
Johnson
, P.
Delattre
, and J.
Booth
, Appl. Phys. Lett.
100
, 133504
(2012
).13.
T.
Lafleur
, P.
Delattre
, E.
Johnson
, and J.
Booth
, Appl. Phys. Lett.
101
, 124104
(2012
).14.
S.
Mohr
, E.
Schüngel
, J.
Schulze
, and U.
Czarnetzki
, J. Phys. D: Appl. Phys.
46
, 435201
(2013
).15.
D. J.
Coumou
, D. H.
Clark
, T.
Kummerer
, M.
Hopkins
, D.
Sullivan
, and S.
Shannon
, IEEE Trans. Plasma Sci.
42
, 1880
(2014
).16.
J.
Waskoenig
and T.
Gans
, Appl. Phys. Lett.
96
, 181501
(2010
).17.
C.
O'Neill
, J.
Waskoenig
, and T.
Gans
, Appl. Phys. Lett.
101
, 154107
(2012
).18.
A.
Greb
, K.
Niemi
, D.
O'Connell
, and T.
Gans
, Appl. Phys. Lett.
103
, 244101
(2013
).19.
A.
Greb
, K.
Niemi
, D.
O'Connell
, G. J.
Ennis
, N.
MacGearailt
, and T.
Gans
, Phys. Plasmas
20
, 053502
(2013
).20.
M.
Shibata
, N.
Nakano
, and T.
Makabe
, J. Appl. Phys.
80
, 6142
(1996
).21.
F. X.
Bronold
, K.
Matyash
, D.
Tskhakaya
, R.
Schneider
, and H.
Fehske
, J. Phys. D: Appl. Phys.
40
, 6583
(2007
).22.
G. J. M.
Hagelaar
and L. C.
Pitchford
, Plasma Sources Sci. Technol.
14
, 722
(2005
).23.
A.
Salabaş
and R. P.
Brinkmann
, Jpn. J. Appl. Phys.
45
, 5203
(2006
).© 2015 AIP Publishing LLC.
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