Using scanning tunneling microscopy and spectroscopy, Auger electron spectroscopy, and low energy electron diffraction, we have studied the growth of Mg deposited on Si(100)-(2 × 1). Coverage from 0.05 monolayer (ML) to 3 ML was investigated at room temperature. The growth mode of the magnesium is a two steps process. At very low coverage, there is formation of an amorphous ultrathin silicide layer with a band gap of 0.74 eV, followed by a layer-by-layer growth of Mg on top of this silicide layer. Topographic images reveal that each metallic Mg layer is formed by 2D islands coalescence process on top of the silicide interfacial layer. During oxidation of the Mg monolayer, the interfacial silicide layer acts as diffusion barrier for the oxygen atoms with a decomposition of the silicide film to a magnesium oxide as function of O2 exposure.
Surface-interface exploration of Mg deposited on Si(100) and oxidation effect on interfacial layer
B. Sarpi, R. Daineche, C. Girardeaux, M. Bertoglio, F. Derivaux, J. P. Biberian, A. Hemeryck, S. Vizzini; Surface-interface exploration of Mg deposited on Si(100) and oxidation effect on interfacial layer. Appl. Phys. Lett. 12 January 2015; 106 (2): 021604. https://doi.org/10.1063/1.4905592
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