In this work, the optical response of graphene to hydrogen plasma treatment is investigated with spectroscopic ellipsometry measurements. Although the electronic transport properties and Raman spectrum of graphene change after plasma hydrogenation, ellipsometric parameters of the Si/SiO2/graphene tri-layer system do not change. This is attributed to plasma hydrogenated graphene still being electrically conductive, since the light absorption of conducting 2D materials does not depend on the electronic band structure. A change in the light transmission can only be observed when higher energy hydrogen ions (30 eV) are employed, which chemically sputter the graphene layer. An optical contrast is still apparent after sputtering due to the remaining traces of graphene and hydrocarbons on the surface. In brief, plasma treatment does not change the light transmission of graphene; and when it does, this is actually due to plasma damage rather than plasma hydrogenation.
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5 January 2015
Research Article|
January 08 2015
Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering
Baran Eren;
Baran Eren
1Department of Physics,
University of Basel
, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
2Materials Sciences Division,
Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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Wangyang Fu;
Wangyang Fu
1Department of Physics,
University of Basel
, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
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Laurent Marot;
Laurent Marot
a)
1Department of Physics,
University of Basel
, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
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Michel Calame;
Michel Calame
1Department of Physics,
University of Basel
, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
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Roland Steiner;
Roland Steiner
1Department of Physics,
University of Basel
, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
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Ernst Meyer
Ernst Meyer
1Department of Physics,
University of Basel
, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
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a)
Electronic mail: laurent.marot@unibas.ch
Appl. Phys. Lett. 106, 011904 (2015)
Article history
Received:
October 23 2014
Accepted:
December 26 2014
Citation
Baran Eren, Wangyang Fu, Laurent Marot, Michel Calame, Roland Steiner, Ernst Meyer; Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering. Appl. Phys. Lett. 5 January 2015; 106 (1): 011904. https://doi.org/10.1063/1.4905597
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