The properties of multilayer exfoliated MoTe2 field-effect transistors (FETs) on SiO2 were investigated for channel thicknesses from 6 to 44 monolayers (MLs). All transistors showed p-type conductivity at zero back-gate bias. For channel thicknesses of 8 ML or less, the transistors exhibited ambipolar characteristics. ON/OFF current ratio was greatest, 1 105, for the transistor with the thinnest channel, 6 ML. Devices showed a clear photoresponse to wavelengths between 510 and 1080 nm at room temperature. Temperature-dependent current-voltage measurements were performed on a FET with 30 layers of MoTe2. When the channel is turned-on and p-type, the temperature dependence is barrier-limited by the Au/Ti/MoTe2 contact with a hole activation energy of 0.13 eV. A long channel transistor model with Schottky barrier contacts is shown to be consistent with the common-source characteristics.
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10 November 2014
Research Article|
November 10 2014
Exfoliated multilayer MoTe2 field-effect transistors
S. Fathipour;
S. Fathipour
a)
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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N. Ma;
N. Ma
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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W. S. Hwang
;
W. S. Hwang
2Department of Materials Engineering,
Korea Aerospace University
, Gyeonggi 412791, South Korea
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V. Protasenko;
V. Protasenko
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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S. Vishwanath;
S. Vishwanath
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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H. G. Xing;
H. G. Xing
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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H. Xu;
H. Xu
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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D. Jena;
D. Jena
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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J. Appenzeller;
J. Appenzeller
3Birck Nanotechnology Center,
Purdue University
, West Lafayette, Indiana 47907, USA
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A. Seabaugh
A. Seabaugh
b)
1Department of Electrical Engineering,
University of Notre Dame
, Notre Dame, Indiana 46556, USA
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a)
Electronic mail: [email protected]
b)
Electronic mail: [email protected]
Appl. Phys. Lett. 105, 192101 (2014)
Article history
Received:
August 20 2014
Accepted:
October 31 2014
Citation
S. Fathipour, N. Ma, W. S. Hwang, V. Protasenko, S. Vishwanath, H. G. Xing, H. Xu, D. Jena, J. Appenzeller, A. Seabaugh; Exfoliated multilayer MoTe2 field-effect transistors. Appl. Phys. Lett. 10 November 2014; 105 (19): 192101. https://doi.org/10.1063/1.4901527
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