Creating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconductor thin films as an example, we calculate surface coverage for a wide range of annealing temperatures and film thicknesses. The model generally predicts that for each value of the annealing temperature there is a range of film thicknesses leading to poor surface coverage. The model accurately reproduces solution-cast thin film coverage for organometal halide perovskites, key modern photovoltaic materials, and identifies processing windows for both high and low levels of surface coverage.
Controlling coverage of solution cast materials with unfavourable surface interactions
V. M. Burlakov, G. E. Eperon, H. J. Snaith, S. J. Chapman, A. Goriely; Controlling coverage of solution cast materials with unfavourable surface interactions. Appl. Phys. Lett. 3 March 2014; 104 (9): 091602. https://doi.org/10.1063/1.4867263
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