Nucleation and growth of highly crystalline silicon nanoparticles in atmospheric-pressure low-temperature microplasmas at gas temperatures well below the Si crystallization threshold and within a short (100 μs) period of time are demonstrated and explained. The modeling reveals that collision-enhanced ion fluxes can effectively increase the heat flux on the nanoparticle surface and this heating is controlled by the ion density. It is shown that nanoparticles can be heated to temperatures above the crystallization threshold. These combined experimental and theoretical results confirm the effective heating and structure control of Si nanoparticles at atmospheric pressure and low gas temperatures.
REFERENCES
1.
E. D.
Sargent
, Nat. Photonics
6
, 133
(2012
).2.
Y.
Shirasaki
, G. J.
Supran
, M. G.
Bawendi
, and V.
Bulović
, Nat. Photonics
7
, 13
(2013
).3.
J.
Fan
and P K.
Chu
, Small
6
, 2080
(2010
).4.
D. K.
Kim
, Y.
Lai
, B. T.
Diroll
, C. B.
Murray
, and C. R.
Kagan
, Nature Commun.
3
, 1216
(2012
).5.
D.
Mariotti
, S.
Mitra
, and V.
Švrček
, Nanoscale
5
, 1385
(2013
).6.
V.
Švrček
, M.
Kondo
, K.
Kalia
, and D.
Mariotti
, Chem. Phys. Lett.
478
, 224
(2009
).7.
V.
Švrček
, D.
Mariotti
, and M.
Kondo
, Appl. Phys. Lett.
97
, 161502
(2010
).8.
K.
Ostrikov
, E. C.
Neyts
, and M.
Meyyappan
, Adv. Phys.
62
, 113
(2013
).9.
D.
Mariotti
and K.
Ostrikov
, J. Phys. D: Appl. Phys.
42
, 092002
(2009
).10.
D.
Mariotti
and R. M.
Sankaran
, J. Phys. D: Appl. Phys.
43
, 323001
(2010
).11.
T.
Belmonte
, G.
Arnoult
, G.
Henrion
, and T.
Gries
, J. Phys. D: Appl. Phys.
44
, 363001
(2011
).12.
W.-H.
Chiang
, C.
Richmonds
, and R. M.
Sankaran
, Plasma Sources Sci. Technol.
19
, 034011
(2010
).13.
R. M.
Sankaran
, D.
Holunga
, R. C.
Flagan
, and K. P.
Giapis
, Nano Lett.
5
, 537
(2005
).14.
T.
Nozaki
, K.
Sasaki
, T.
Ogino
, D.
Asahi
, and K.
Okazaki
, Nanotechnology
18
, 235603
(2007
).15.
S. Q.
Xiao
and S.
Xu
, J. Phys. D: Appl. Phys.
44
, 174033
(2011
).16.
F.
Priolo
, T.
Gregorkiewicz
, M.
Galli
, and T. F.
Krauss
, Nat. Nanotechnol.
9
, 19
(2014
).17.
A. J.
Nozik
, Nano Lett.
10
, 2735
(2010
).18.
L.
Mangolini
and U.
Kortshagen
, Phys. Rev. E
79
, 026405
(2009
).19.
J. E.
Daugherty
and D. B.
Graves
, J. Vac. Sci. Technol., A
11
, 1126
(1993
).20.
G. H. P. M.
Swinkels
, H.
Kersten
, H.
Deutsch
, and G. M. W.
Kroesen
, J. Appl. Phys.
88
, 1747
(2000
).21.
H. R.
Maurer
and H.
Kersten
, J. Phys. D: Appl. Phys.
44
, 174029
(2011
).22.
S.
Hofmann
, A. F. H.
van Gessel
, T.
Verreycken
, and P.
Bruggeman
, Plasma Sources Sci. Technol.
20
, 065010
(2011
).23.
S. Y.
Moon
and W.
Choe
, Spectrochim. Acta, Part B
58
, 249
(2003
).24.
J.
Luque
and D. R.
Crosley
, SRI International Report No. MP-99-009, 1999
.25.
S. G.
Belostotskiy
, T.
Ouk
, V. M.
Donnelly
, D. J.
Economou
, and N.
Sadeghi
, J. Appl. Phys.
107
, 053305
(2010
).26.
S.
Namba
, T.
Yamasaki
, Y.
Hane
, D.
Fukuhara
, K.
Kozue
, and K.
Takiyama
, J. Appl. Phys.
110
, 073307
(2011
).27.
X.-M.
Zhu
, W.-C.
Chen
, and Y.-K.
Pu
, J. Phys. D: Appl. Phys.
41
, 105212
(2008
).28.
J. E.
Allen
, Phys. Scr.
45
, 497
(1992
).29.
S. V.
Vladimirov
, K. N.
Ostrikov
, M. Y.
Yu
, and L.
Stenflo
, Phys. Rev. E
58
, 8046
(1998
).30.
M.
Keidar
, O. R.
Monteiro
, A.
Anders
, and I. D.
Boyd
, Appl. Phys. Lett.
81
, 1183
(2002
).31.
M.
Lampe
, V.
Gavrishchaka
, G.
Ganguli
, and G.
Joyce
, Phys. Rev. Lett.
86
, 5278
(2001
).32.
A. V.
Zobnin
, A. P.
Nefedov
, V. A.
Sinelshchikov
, and V. E.
Fortov
, J. Exp. Theor. Phys.
91
, 483
(2000
).33.
S. A.
Khrapak
, S. V.
Ratynskaia
, A. V.
Zobnin
, A. D.
Usachev
, V. V.
Yaroshenko
, M. H.
Thoma
, M.
Kretschmer
, H.
Hofner
, G. E.
Morfill
, O. F.
Petrov
, and V. E.
Fortov
, Phys. Rev. E
72
, 016406
(2005
).34.
M.
Gatti
and U.
Kortshagen
, Phys. Rev. E
78
, 046402
(2008
).35.
S. A.
Khrapak
and G. E.
Morfill
, Phys. Plasmas
15
, 114503
(2008
).36.
L. G.
D'yachkov
, A. G.
Khrapak
, S. A.
Khrapak
, and G. E.
Morfill
, Phys. Plasmas
14
, 042102
(2007
).37.
F.
Liu
, K. J.
Daun
, D. R.
Snelling
, and G. J.
Smallwood
, Appl. Phys. B
83
, 355
(2006
).38.
W. M.
Trott
, J. N.
Castañeda
, J. R.
Torczynski
, M. A.
Gallis
, and D. J.
Rader
, Rev. Sci. Instrum.
82
, 035120
(2011
).39.
M.
Hirasawa
, T.
Orii
, and T.
Seto
, Appl. Phys. Lett.
88
, 093119
(2006
).40.
See supplementary material at http://dx.doi.org/10.1063/1.4872254 for further analysis of chemical and optical properties of Si nanoparticles.
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