Interband quantum tunneling of electrons in semiconductors is of intense recent interest as the underlying transport mechanism in tunneling field-effect transistors. Such transistors can potentially perform electronic switching with lower energy than their conventional counterparts. The recent emergence of two-dimensional (2D) semiconducting crystals provides an attractive material platform for realizing such devices. In this work, we derive an analytical expression for understanding tunneling current flow in single-layer 2D crystal semiconductors in the k-space. We apply the results to a range of 2D crystal semiconductors, and compare it with tunneling currents in three-dimensional semiconductors. We also discuss the implications for tunneling devices.
Skip Nav Destination
Article navigation
1 April 2013
Research Article|
April 01 2013
Interband tunneling in two-dimensional crystal semiconductors
Nan Ma;
Nan Ma
Department of Electrical Engineering, University of Notre Dame
, Notre Dame, Indiana 46556, USA
Search for other works by this author on:
Debdeep Jena
Debdeep Jena
a)
Department of Electrical Engineering, University of Notre Dame
, Notre Dame, Indiana 46556, USA
Search for other works by this author on:
a)
Electronic mail: [email protected]
Appl. Phys. Lett. 102, 132102 (2013)
Article history
Received:
February 06 2013
Accepted:
March 20 2013
Connected Content
A correction has been published:
Erratum: “Interband tunneling in two-dimensional crystal semiconductors” [Appl. Phys. Lett. 102, 132102 (2013)]
Citation
Nan Ma, Debdeep Jena; Interband tunneling in two-dimensional crystal semiconductors. Appl. Phys. Lett. 1 April 2013; 102 (13): 132102. https://doi.org/10.1063/1.4799498
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Era of entropy: Synthesis, structure, properties, and applications of high-entropy materials
Christina M. Rost, Alessandro R. Mazza, et al.
Sputter epitaxy of ScAlN films on GaN high electron mobility transistor structures
Tomoya Okuda, Shunsuke Ota, et al.
Related Content
A tunneling field effect transistor model combining interband tunneling with channel transport
J. Appl. Phys. (November 2011)
Gallium nitride tunneling field-effect transistors exploiting polarization fields
Appl. Phys. Lett. (February 2020)
Modeling direct interband tunneling. II. Lower-dimensional structures
J. Appl. Phys. (August 2014)
Tunneling field effect transistor integrated with black phosphorus-MoS2 junction and ion gel dielectric
Appl. Phys. Lett. (January 2017)
Modeling direct interband tunneling. I. Bulk semiconductors
J. Appl. Phys. (August 2014)