Here, we report on high-performance top-gated poly(3,3″′-dialkyl-quarterthiophene) (PQT-12) organic thin-film transistors (OTFTs) with reverse-offset-printed (ROP) silver (Ag) source/drain (S/D) electrodes. OTFT devices with ROP S/D electrodes using Ag nanopaste show higher performance (∼0.01 cm2/Vs) than those fabricated by vacuum electron beam evaporation with conventional photolithography and a standard lift-off process (∼1 × 10−3 cm2/Vs). This dissimilarity is attributed to the higher work function (−4.9 eV) of the ROP Ag electrode due to AgO formation on the Ag surface during thermal annealing. This results in a low interfacial hole injection energy barrier between the S/D electrodes and the PQT-12 semiconductor.

1.
G. H.
Gelinck
,
H. E. A.
Huitema
,
E. V.
Veenendaal
,
E.
Cantatore
,
L.
Schrijnemakers
,
J. B. P. H. V. D.
Putten
,
T. C. T.
Geuns
,
M.
Beenhakkers
,
J. B.
Giesbers
,
B.-H.
Huisman
,
E. J.
Meijer
,
E. M.
Benito
,
F. J.
Touwslager
,
A. W.
Marsman
,
B. J. E. V.
Rens
, and
D. M. D.
Leeuw
,
Nature Mater.
3
,
106
(
2004
).
3.
K.-J.
Baeg
,
D.
Khim
,
J.
Kim
,
B.-D.
Yang
,
M.
Kang
,
S. W.
Jung
,
I.-K.
You
,
D.-Y.
Kim
, and
Y.-Y.
Noh
,
Adv. Funct. Mater.
22
,
2915
(
2012
).
4.
R.
Rotzoll1
,
S.
Mohapatra
,
V.
Olariu
,
R.
Wenz
,
M.
Grigas
,
K.
Dimmler
,
O.
Shchekin
, and
A.
Dodabalapur
,
Appl. Phys. Lett.
88
,
123502
(
2006
).
5.
B.
Crone
,
A.
Dodabalapur
,
A.
Gelperin
,
L.
Torsi
,
H. E.
Katz
,
A. J.
Lovinger
, and
Z.
Bao
,
Appl. Phys. Lett.
78
,
2229
(
2001
).
6.
S.
Allard
,
M.
Forster
,
B.
Souharce
,
H.
Thiem
, and
U.
Scherf
,
Angew. Chem., Int. Ed.
47
,
4070
(
2008
).
7.
K.-J.
Baeg
,
J.
Kim
,
D.
Khim
,
M.
Caironi
,
D.-Y.
Kim
,
I.-K.
You
,
J. R.
Quinn
,
A.
Facchetti
, and
Y.-Y.
Noh
,
ACS Appl. Mater. Interfaces
3
,
3205
(
2011
).
8.
S. H.
Ahn
and
L. J.
Guo
,
ACS Nano
3
,
2304
(
2009
).
9.
D. A.
Pardo
,
G. E.
Jabbour
, and
N.
Peyghambarian
,
Adv. Mater.
12
,
1249
(
2000
).
10.
Y.-Y.
Noh
,
N.
Zhao
,
M.
Caironi
, and
H.
Sirringhaus
,
Nature Nanotechnol.
2
,
784
(
2007
).
11.
T.
Mäkelä
,
S.
Jussila
,
H.
Kosonen
,
T. G.
Bäcklund
,
H. G. O.
Sandberg
, and
H.
Stubb
,
Synth. Met.
153
,
285
(
2005
).
12.
H.
Yan
,
Z.
Chen
,
Y.
Zheng
,
C.
Newman
,
J. R.
Quinn
,
F.
Dötz
,
M.
Kastler
, and
A.
Facchetti
,
Nature
457
,
679
(
2009
).
13.
D.
Zielke
,
A. C.
Hübler
,
U.
Hahn
,
N.
Brandt
,
M.
Bartzsch
,
U.
Fügmann
,
T.
Fischer
,
J.
Veres
, and
S.
Ogier
,
Appl. Phys. Lett.
87
,
123508
(
2005
).
14.
T.-H.
Moon
,
S.-H.
Nam
,
N.-K.
Kim
,
Y.-K.
Kook
,
Y.-K.
Jung
,
Y.-G.
Chang
,
S.-S.
Yoo
,
C.-D.
Kim
,
I.
Kang
, and
I.-J.
Chung
,
SID Int. Symp. Digest Tech. Papers
40
,
1348
(
2009
).
15.
S. M.
Sze
and
K. K.
Ng
,
Physics of Semiconductor Devices
, 3rd ed. (
Wiley-Interscience
,
New York
,
2007
).
16.
R.
Zhang
,
K.-S.
Moon
,
W.
Lin
, and
C. P.
Wong
,
J. Mater. Chem.
20
,
2018
(
2010
).
17.
D.
Kim
and
J.
Moon
,
Electrochem. Solid-State Lett.
8
,
J30
(
2005
).
18.
Y.
Wu
,
Y.
Li
, and
B. S.
Ong
,
J. Am. Chem. Soc.
128
,
4202
(
2006
).
19.
J.-W.
Park
and
S.-G.
Baek
,
Scr. Mater.
55
,
1139
(
2006
).
20.
B. S.
Ong
,
Y.
Wu
,
P.
Liu
, and
S.
Gardner
,
Adv. Mater.
17
,
1141
(
2005
).
21.
C.
Yun
,
M.
Kim
,
S. W.
Lee
,
H.
Moon
,
S.
Park
,
J. B.
Koo
,
J. W.
Kim
,
I.-K.
You
, and
S.
Yoo
,
IEEE Electron Device Lett.
32
,
1454
(
2011
).
22.
C.-W.
Chen.
P.-Y.
Hsieh
,
H.-H.
Chiang
,
C.-L.
Lin
,
H.-M.
Wu
, and
C.-C.
Wu
,
Appl. Phys. Lett.
83
,
5127
(
2003
).
23.
J. B.
Kim
,
C. S.
Kim
,
Y. S.
Kim
, and
Y.-L.
Loo
,
Appl. Phys. Lett.
95
,
183301
(
2009
).
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