Here, we report on high-performance top-gated poly(3,3″′-dialkyl-quarterthiophene) (PQT-12) organic thin-film transistors (OTFTs) with reverse-offset-printed (ROP) silver (Ag) source/drain (S/D) electrodes. OTFT devices with ROP S/D electrodes using Ag nanopaste show higher performance (∼0.01 cm2/Vs) than those fabricated by vacuum electron beam evaporation with conventional photolithography and a standard lift-off process (∼1 × 10−3 cm2/Vs). This dissimilarity is attributed to the higher work function (−4.9 eV) of the ROP Ag electrode due to AgO formation on the Ag surface during thermal annealing. This results in a low interfacial hole injection energy barrier between the S/D electrodes and the PQT-12 semiconductor.
REFERENCES
1.
G. H.
Gelinck
, H. E. A.
Huitema
, E. V.
Veenendaal
, E.
Cantatore
, L.
Schrijnemakers
, J. B. P. H. V. D.
Putten
, T. C. T.
Geuns
, M.
Beenhakkers
, J. B.
Giesbers
, B.-H.
Huisman
, E. J.
Meijer
, E. M.
Benito
, F. J.
Touwslager
, A. W.
Marsman
, B. J. E. V.
Rens
, and D. M. D.
Leeuw
, Nature Mater.
3
, 106
(2004
).2.
S. R.
Forrest
, Nature
428
, 911
(2004
).3.
K.-J.
Baeg
, D.
Khim
, J.
Kim
, B.-D.
Yang
, M.
Kang
, S. W.
Jung
, I.-K.
You
, D.-Y.
Kim
, and Y.-Y.
Noh
, Adv. Funct. Mater.
22
, 2915
(2012
).4.
R.
Rotzoll1
, S.
Mohapatra
, V.
Olariu
, R.
Wenz
, M.
Grigas
, K.
Dimmler
, O.
Shchekin
, and A.
Dodabalapur
, Appl. Phys. Lett.
88
, 123502
(2006
).5.
B.
Crone
, A.
Dodabalapur
, A.
Gelperin
, L.
Torsi
, H. E.
Katz
, A. J.
Lovinger
, and Z.
Bao
, Appl. Phys. Lett.
78
, 2229
(2001
).6.
S.
Allard
, M.
Forster
, B.
Souharce
, H.
Thiem
, and U.
Scherf
, Angew. Chem., Int. Ed.
47
, 4070
(2008
).7.
K.-J.
Baeg
, J.
Kim
, D.
Khim
, M.
Caironi
, D.-Y.
Kim
, I.-K.
You
, J. R.
Quinn
, A.
Facchetti
, and Y.-Y.
Noh
, ACS Appl. Mater. Interfaces
3
, 3205
(2011
).8.
S. H.
Ahn
and L. J.
Guo
, ACS Nano
3
, 2304
(2009
).9.
D. A.
Pardo
, G. E.
Jabbour
, and N.
Peyghambarian
, Adv. Mater.
12
, 1249
(2000
).10.
Y.-Y.
Noh
, N.
Zhao
, M.
Caironi
, and H.
Sirringhaus
, Nature Nanotechnol.
2
, 784
(2007
).11.
T.
Mäkelä
, S.
Jussila
, H.
Kosonen
, T. G.
Bäcklund
, H. G. O.
Sandberg
, and H.
Stubb
, Synth. Met.
153
, 285
(2005
).12.
H.
Yan
, Z.
Chen
, Y.
Zheng
, C.
Newman
, J. R.
Quinn
, F.
Dötz
, M.
Kastler
, and A.
Facchetti
, Nature
457
, 679
(2009
).13.
D.
Zielke
, A. C.
Hübler
, U.
Hahn
, N.
Brandt
, M.
Bartzsch
, U.
Fügmann
, T.
Fischer
, J.
Veres
, and S.
Ogier
, Appl. Phys. Lett.
87
, 123508
(2005
).14.
T.-H.
Moon
, S.-H.
Nam
, N.-K.
Kim
, Y.-K.
Kook
, Y.-K.
Jung
, Y.-G.
Chang
, S.-S.
Yoo
, C.-D.
Kim
, I.
Kang
, and I.-J.
Chung
, SID Int. Symp. Digest Tech. Papers
40
, 1348
(2009
).15.
S. M.
Sze
and K. K.
Ng
, Physics of Semiconductor Devices
, 3rd ed. (Wiley-Interscience
, New York
, 2007
).16.
R.
Zhang
, K.-S.
Moon
, W.
Lin
, and C. P.
Wong
, J. Mater. Chem.
20
, 2018
(2010
).17.
D.
Kim
and J.
Moon
, Electrochem. Solid-State Lett.
8
, J30
(2005
).18.
Y.
Wu
, Y.
Li
, and B. S.
Ong
, J. Am. Chem. Soc.
128
, 4202
(2006
).19.
J.-W.
Park
and S.-G.
Baek
, Scr. Mater.
55
, 1139
(2006
).20.
B. S.
Ong
, Y.
Wu
, P.
Liu
, and S.
Gardner
, Adv. Mater.
17
, 1141
(2005
).21.
C.
Yun
, M.
Kim
, S. W.
Lee
, H.
Moon
, S.
Park
, J. B.
Koo
, J. W.
Kim
, I.-K.
You
, and S.
Yoo
, IEEE Electron Device Lett.
32
, 1454
(2011
).22.
C.-W.
Chen.
P.-Y.
Hsieh
, H.-H.
Chiang
, C.-L.
Lin
, H.-M.
Wu
, and C.-C.
Wu
, Appl. Phys. Lett.
83
, 5127
(2003
).23.
J. B.
Kim
, C. S.
Kim
, Y. S.
Kim
, and Y.-L.
Loo
, Appl. Phys. Lett.
95
, 183301
(2009
).© 2012 American Institute of Physics.
2012
American Institute of Physics
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