Nonpolar epitaxial films were grown by plasma-assisted molecular beam epitaxy on a-plane ZnO substrates. A smooth surface morphology was accomplished under oxygen-rich growth conditions. The benefits of the use of ZnO substrates on the structural properties are reflected by a low-density of threading dislocations. Furthermore, no indications for the generation of basal plane stacking faults are found. The pseudomorphic growth on a-plane ZnO substrates efficiently locks the epitaxial films to the wurtzite structure up to x = 0.25. The Mg concentration is not constant and increases with larger thickness. The optical properties reflect the influence of alloy disorder.
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From the area probed by the electron beam an upper limit of the dislocation density of is estimated.