In the Fig. 1, the color of the GIXRD plots of Si/SiO2 bare substrate and 400°C annealed film is inadvertently interchanged. The figure is corrected below. This correction affects no other part of the article.

FIG. 1.

GIXRD measurements of bare substrate (Si/SiO2) and Co40Fe40B20 thin film of thickness 40 nm in as-deposited and annealed states.

FIG. 1.

GIXRD measurements of bare substrate (Si/SiO2) and Co40Fe40B20 thin film of thickness 40 nm in as-deposited and annealed states.

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