At the October 1997 NIST “Workshop for Thin Dielectric Film Metrology”, uses of ellipsometers, and the role of standard materials for semiconductor metrology were two of several important topics discussed. Much of the workshop discussion centered on metrology for thin gate oxides. This paper is an extension of some of the topics discussed at that workshop.
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© 1998 American Institute of Physics.
1998
American Institute of Physics
