Titanium dioxide (TiO2) thin films are deposited on silicon substrates by using sol-gel dip coating technique. Annealing temperature was varied to investigate its effect on the surface morphology, structural and electrical properties of the film. The crystalline structure, surface morphology and the electrical properties were investigated by X-ray diffraction, field emission scanning electron microscopy (FESEM), atomic force microscope (AFM), and four point probe. The results show that with an increase in annealing temperature, the value of the intensity of (101) peak increases while the value of the full-width at half maximum decreases. Thin films deposited at high annealing temperatures result in an increase in surface roughness and grain size. The electrical properties of these films show that the resistivity varies between 1.40 × 105 and 7.19 × 102 Ω.cm when the annealing temperature changes from 300 to 900°C, respectively. The TiO2 thin films annealed at 900°C exhibited lower resistivity than other films. It found that the annealing temperature influences the surface morphology, structural and electrical properties of TiO2 thin films.

1.
I.
Iatsunskyi
,
M.
Jancelewicz
,
G.
Nowaczyk
,
M.
Kempiński
,
B.
Peplińska
,
M.
Jarek
,
K.
Załęski
,
S.
Jurga
, and
V.
Smyntyna
,
Thin Solid Films
589
,
303
308
(
2015
).
2.
L.
Castañeda
, a
López-Suárez
, and a
Tiburcio-Silver
,
J. Nanosci. Nanotechnol.
10
(
2
),
1343
1348
(
2010
).
3.
N. H.
Aljufairi
,
Energy
39
(
1
),
6
10
(
2012
).
4.
P.
Kajitvichyanukul
,
J.
Ananpattarachai
, and
S.
Pongpom
,
Sci. Technol. Adv. Mater.
6
(
3–4
),
352
358
(
2005
).
5.
A. A.
Haidry
,
P.
Schlosser
,
P.
Durina
,
M.
Mikula
,
M.
Tomasek
,
T.
Plecenik
,
T.
Roch
,
A.
Pidik
,
M.
Stefecka
,
J.
Noskovic
,
M.
Zahoran
,
P.
Kus
, and
A.
Plecenik
,
Cent. Eur. J. Phys.
9
(
5
),
1351
1356
(
2011
).
6.
K.
Kądzioła
,
I.
Piwoński
,
A.
Kisielewska
,
D.
Szczukocki
,
B.
Krawczyk
, and
J.
Sielski
,
Appl. Surf. Sci.
,
288
,
503
512
(
2014
).
7.
A.
Anderson
and
R.
Binions
,
Coatings
,
4
(
4
),
796
809
(
2014
).
8.
N.
Barati
,
M. a F.
Sani
,
H.
Ghasemi
,
Z.
Sadeghian
, and
S. M. M.
Mirhoseini
,
Appl. Surf. Sci.
255
,
8328
8333
(
2009
).
9.
E.
Haimi
,
H.
Lipsonen
,
J.
Larismaa
,
M.
Kapulainen
,
J.
Krzak-Ros
, and
S.-P.
Hannula
,
Thin Solid Films
519
(
18
),
5882
5886
(
2011
).
10.
A. M.
Luís
,
M. C.
Neves
,
M. H.
Mendonça
, and
O. C.
Monteiro
,
Mater. Chem. Phys.
125
,
20
25
(
2011
).
11.
D.
Reyes-Coronado
,
G.
Rodríguez-Gattorno
,
M. E.
Espinosa-Pesqueira
,
C.
Cab
,
R.
de Coss
, and
G.
Oskam
,
Nanotechnology
19
(
14
),
145605
, (
2008
).
12.
A.
Di Paola
,
M.
Bellardita
, and
L.
Palmisano
,
Catalysts
3
(
1
),
36
73
(
2013
).
13.
R.
Mechiakh
,
N.
Ben Sedrine
,
R.
Chtourou
, and
R.
Bensaha
,
Appl. Surf. Sci.
257
(
3
),
670
676
(
2010
).
14.
14.
D.
Kim
,
Mater. Lett.
57
,
355
360
(
2002
).
15.
R.
Mechiakh
,
N.
Ben Sedrine
,
J.
Ben Naceur
, and
R.
Chtourou
,
Surf. Coatings Technol.
206
(
2–3
),
243
249
(
2011
).
16.
B.
Lyson-sypien
,
M.
Radecka
,
M.
Rekas
,
K.
Swierczek
, and
K.
Michalow-mauke
,
Sensors Actuators B. Chem.
211
,
67
76
(
2015
).
17.
K.
Eufinger
,
D.
Poelman
,
H.
Poelman
,
R.
De Gryse
, and
G.B.
Marin
,
Thin Solid Film. Process Appl.
661
,
189
227
(
2008
).
18.
M. S. P.
Sarah
,
M. Z.
Musa
,
M. N.
Asiah
, and
M.
Rusop
, “
Electrical conductivity characteristics of TiO2 thin film
,” in
International Conference on Electronic Devices, Systems and Applications (ICEDSA 2010), IEEE Xplore
2010
, PP.
361
364
.
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