Multilayer mirrors present an attractive alternative for reflective hard X-ray monochromators due to their increased bandwidth compared with crystal-based systems. An issue remains the strong modulations in the reflected beam profile, i.e. an irregular stripe pattern. This is a major problem for micro-imaging applications, where multilayer-based monochromators are frequently employed to deliver higher photon flux density. A subject of particular interest is how to overcome beam profile modifications, namely the stripe patterns, induced by the reflection on a multilayer. For multilayer coatings in general it is known that the substrate and its surface quality significantly influence the performance of such kind of mirrors as the coating reproduces to a certain degree roughness and shape of the substrate. Our studies have shown that modified coatings can significantly change the impact of the multilayer reflection on the beam profile. We will present recent results as well as a critical review.

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