This paper briefly presents some important aspects of the GaSb‐based material growth, as well as the performance of photodiodes and TPV devices for the 0.9–2.55 μm spectral range. A reproducible technique has been developed for the production of high‐speed and high‐efficiency GaSb/GaInAsSb/GaAlAsSb photodiodes. The detectivity of the photodiodes, estimated from the measured noise level and monochromatic current sensitivity, in the spectral peak reaches D*(λmax, 1000, 1)=(0.8–1.0)×1011 W−1×cm×Hz1/2 at room temperature. Recently, we have adapted the technology for creating GaInAsSb (0.52–0.53 eV band gap) TPV devices. Based on the our results we believe a 0.5 eV band gap GaSb‐based TPV cell with an open‐circuit voltage well over 300 mV at current 2–3 A is a realistic near‐term goal.

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