An accelerator facility dedicated to ion beam materials analysis and modification has been completed at the Environmental Molecular Sciences Laboratory (EMSL), a United States Department of Energy collaborative scientific user facility located at the Pacific Northwest National Laboratory in Richland, WA. The EMSL accelerator facility is based on a Model 9SDH-2 3.4 MV tandem ion accelerator manufactured by National Electrostatics Corporation (NEC, Middleton, WI), which includes RF plasma and sputter ion sources. Three beam lines were originally constructed with integral end stations for materials analysis and modification. Recently, the +30° beam line was extended to accommodate an NEC electrostatic microquad assembly, which provides focussed beam spots of 20 μm or less on target. Efforts are currently underway to incorporate particle induced x-ray emission (PIXE), Rutherford backscattering spectrometry (RBS), and nuclear reaction analysis (NRA) capabilities in the microbeam line end station.
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10 June 1999
The fifteenth international conference on the application of accelerators in research and industry
4-7 Nov 1998
Denton, Texas (USA)
Research Article|
June 10 1999
Status of the accelerator facility at the Environmental Molecular Sciences Laboratory Available to Purchase
D. E. McCready;
D. E. McCready
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352
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S. Thevuthasan;
S. Thevuthasan
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352
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W. Jiang
W. Jiang
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352
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D. E. McCready
S. Thevuthasan
W. Jiang
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352
AIP Conf. Proc. 475, 537–540 (1999)
Citation
D. E. McCready, S. Thevuthasan, W. Jiang; Status of the accelerator facility at the Environmental Molecular Sciences Laboratory. AIP Conf. Proc. 10 June 1999; 475 (1): 537–540. https://doi.org/10.1063/1.59268
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