was evaporated in an UHV system onto substrates of the layered materials HOPG, and mica at substrate temperatures of 25 °C, 100 °C and 200 °C. The initial growth of the films was investigated by atomic force microscopy (UHV-AFM) and compared to that of Distinct island sizes and shapes were observed for the three substrates, reflecting different mobilities and sticking factors. For on HOPG and extended dendritic islands are formed indicating a large mobility of on the substrate and a strong sticking of the molecules to the islands edges. The mobility during the growth of the second monolayer is significantly reduced therefore, nearly independent of the substrate temperature, many new nucleation centres with distances as small as 50 nm are formed on top of the 1000–3000 nm monolayer islands. On mica, the nucleation centres have distances of 50–100 nm even for the first monolayer and substrate temperatures of 200 °C. This shows that the substrate interaction of with mica is larger than that with HOPG and
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11 August 1998
The 12th international winterschool on electronic properties of novel materials: progress in molecular nanostructures
March 1998
Kirchberg, Tyrol, (Austria)
Research Article|
August 11 1998
Film growth of on layered materials
B. Pietzak;
B. Pietzak
1Hahn-Meitner-Institut Berlin, Glienickerstrasse 100, D-14109 Berlin, Germany
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C. Sommerhalter;
C. Sommerhalter
1Hahn-Meitner-Institut Berlin, Glienickerstrasse 100, D-14109 Berlin, Germany
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A. Weidinger;
A. Weidinger
1Hahn-Meitner-Institut Berlin, Glienickerstrasse 100, D-14109 Berlin, Germany
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B. Nuber;
B. Nuber
2Universität Erlangen-Nürnberg, Institut für Organische Chemie, Henkestrasse 42, D-91054 Erlangen, Germany
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U. Reuther;
U. Reuther
2Universität Erlangen-Nürnberg, Institut für Organische Chemie, Henkestrasse 42, D-91054 Erlangen, Germany
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A. Hirsch
A. Hirsch
2Universität Erlangen-Nürnberg, Institut für Organische Chemie, Henkestrasse 42, D-91054 Erlangen, Germany
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AIP Conf. Proc. 442, 223–226 (1998)
Citation
B. Pietzak, C. Sommerhalter, A. Weidinger, B. Nuber, U. Reuther, A. Hirsch; Film growth of on layered materials. AIP Conf. Proc. 11 August 1998; 442 (1): 223–226. https://doi.org/10.1063/1.56463
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