Accelerated ionized cluster beams are used for micromachining of bulk diamond, CVD diamond films, single-crystalline silicon, or Pyrex glass, among others. Beams of clusters of CO2 or of SF6 with about 1000 molecules per unit charge are accelerated to up to 120 KeV kinetic energy for mask projective surface bombardment. Patterning is achieved via physical as well as chemical surface erosion: reactive accelerated cluster erosion (RACE). Very smooth eroded surfaces result for bulk natural diamond, silicon, metals and glass. Polycrystalline, strongly faceted CVD diamond films are effectively planarized. Submicrometer structures with adjustable wall inclination can be generated. Surface melting seems to govern the cluster impact induced nanomodifications.

This content is only available via PDF.
You do not currently have access to this content.