Accelerated ionized cluster beams are used for micromachining of bulk diamond, CVD diamond films, single-crystalline silicon, or Pyrex glass, among others. Beams of clusters of or of with about 1000 molecules per unit charge are accelerated to up to 120 KeV kinetic energy for mask projective surface bombardment. Patterning is achieved via physical as well as chemical surface erosion: reactive accelerated cluster erosion (RACE). Very smooth eroded surfaces result for bulk natural diamond, silicon, metals and glass. Polycrystalline, strongly faceted CVD diamond films are effectively planarized. Submicrometer structures with adjustable wall inclination can be generated. Surface melting seems to govern the cluster impact induced nanomodifications.
Skip Nav Destination
Article navigation
5 February 1997
The fourteenth international conference on the application of accelerators in research and industry
6-9 Nov 1996
Denton, Texas (USA)
Research Article|
February 05 1997
Reactive accelerated cluster erosion (RACE) for micromachining
J. Gspann
J. Gspann
Universität Karlsruhe und Forschungszentrum Karlsruhe, Institut für Mikrostrukturtechnik, Postfach 3640, D-76021 Karlsruhe, Germany
Search for other works by this author on:
AIP Conf. Proc. 392, 503–506 (1997)
Citation
J. Gspann; Reactive accelerated cluster erosion (RACE) for micromachining. AIP Conf. Proc. 5 February 1997; 392 (1): 503–506. https://doi.org/10.1063/1.52510
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
4
Views
Citing articles via
Inkjet- and flextrail-printing of silicon polymer-based inks for local passivating contacts
Zohreh Kiaee, Andreas Lösel, et al.
Effect of coupling agent type on the self-cleaning and anti-reflective behaviour of advance nanocoating for PV panels application
Taha Tareq Mohammed, Hadia Kadhim Judran, et al.
Design of a 100 MW solar power plant on wetland in Bangladesh
Apu Kowsar, Sumon Chandra Debnath, et al.
Related Content
Nanostructuring by reactive accelerated cluster erosion
J. Vac. Sci. Technol. B (July 1997)
Reactive accelerated cluster erosion for microstructuring
AIP Conference Proceedings (June 1997)
The effect of impact velocity on interfacial adhesion of contact-mode surface micromachines
Appl. Phys. Lett. (August 2012)
Evolution of sidewall adhesion in surface micromachines due to repetitive impact loading
J. Appl. Phys. (March 2012)
Improvements in focused ion beam micromachining of interconnect materials
J. Vac. Sci. Technol. B (December 2002)