Graphene-Infused copper contacts: Achieving ultra-low resistance ohmic interfaces

Contact resistance (Rc) is an extremely significant metric to determine the caliber of ohmic contact which regulates the current flow. This study examines the contact interface of several materials, specifically Copper metal – Copper metal [Cu_m − Cu_m], Copper metal – Graphene layer [Cu_m − Gr_l], Graphene layer – Graphene layer [Gr_l − Gr_l], and Graphene layer coated over Copper metal – Graphene layer [Cu_m/Gr_l – Gr_l]. The COMSOL Multiphysics simulation software is utilized to investigate the electrical and structural analysis of the contact interface. The contact resistance is greatly reduced at the interface of Cu_m/Gr_l, increasing current density. Low-resistance ohmic contacts are highly advantageous in many electronic devices such as high electron mobility transistors, MOSFETs, and electromechanical relays. They are beneficial in various applications, from low-power digital logic to high-power scenarios.