A gas-phase deposition is one of the types of additive technologies and is a process of applying a film or coating to the cooled surface, that is, a continuous layer of material that has, among other things, a nanocrystalline structure. Currently, the development of this and other additive technologies has made it possible to apply a variety of coatings with different properties. In most works devoted to the deposition numerical simulation, the features of gas heat exchange with the surface are not taken into account, while the temperature of the surface on which deposition occurs is one of the fundamental factors determining the film structure. In this paper, a numerical model of heat transfer during gas-phase deposition of a material on a cooled curved substrate is constructed, taking into account the specifics of heat exchange of the gas medium. A numerical analysis of the mathematical model is performed, and the influence of various heat transfer mechanisms on the temperature distribution in the substrate being built up is shown.
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