Evolution of transparent graphene oxide thin films synthesized using Langmuir-Blodgett technique

In this work uniform, transparent thin films of Graphene Oxide (GO) of variable thickness have been prepared using Langmuir Blodgett (LB) deposition process. Surface pressure-area isotherms and hysteresis measurements have been used to characterize the GO Langmuir thin films on the water sub-phase prior to transfer onto solid substrate to determine the suitable deposition parameters. AFM analysis of the deposited films (1,2,4 and 5 layers) shows that the films are continuous and smooth (low r.m.s. roughness). The roughness of the films increases with increasing number of transferred layers and smoother films are obtained for higher barrier compression rates.