Growth of V₂O₅ nanopillers using plasma assisted oxidation cum sublimation Available to Purchase

Vertically aligned and uniformly distributed vanadium pentoxide (V₂O₅) nanopillers accompanied with sharp vertices have been deposited on Ni coated silicon [100] substrate using plasma assisted oxidation cum sublimation process (PASP). The morphological, structural, and vibrational properties of nanopillers have been investigated systematically. The structural analysis of nanostructured thin films divulges the existence of only orthorhombic phase of vanadium oxide (i.e. α-V₂O₅). In Raman analysis, all the recorded peaks are completely matched with the reported peaks of orthorhombic V₂O₅, which again indicate the growth of nanostructure on film. On the basis of comparative morphological analysis between our previous reports [1-3] and the present study it can be said that the single crystalline Si surface is the most appropriate substrate for the controlled growth of vertically aligned nanopillers on large scale when placed suitably. To study the nanopillers in deep on individual basis, TEM, HRTEM and measurements are conducted, which asserts the single crystalline nature of nanopillers. The brief discussion of the growth of nanopillers has also been discussed in present report.