In this paper we report the observation of Anomalous Hall Effect (AHE) in the well characterized Nickel thin film of ∼ 17 nm thickness. Thin film of Nickel is grown on Silicon (100) substrate using metal evaporation unit and characterized by XRD and XRR measurements. Nickel being ferromagnetic below 627K shows the contribution of both ordinary hall resistivity (due Lorentz force from applied magnetic field) as well as anomalous hall resistivity (due to spontaneous magnetization). Anomalous hall resistivity increases with temperature in the observed temperature range of (10-150K) showing the scaling with longitudinal resistivity of metallic behavior of Nickel.

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