The creating of nanopore ensemble in a polymethylmethacrylate (PMMA) film using swift heavy ion irradiation was studied. The pores are formed in the PMMA film by irradiation with Xe ion with energy of 167 MeV and the subsequent etching. Atomic force microscopy revealed that the created pore diameters was in the range of 50-100 nm and the depths in the range 20-60 nm. The resulting pores might be filled with different materials and used in various areas of micro- and nanoelectronics.

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