We report an alternative approach to fabricate the vertically aligned aperiodic Si nanowire arrays by controlling the diameter of the Ag nanoparticles and tuneable ultrasonic removal. The process begins by sputtering the Ag thin film (t=5 nm) on the Si/SiO2 substrates. Followed by Ag thin film, annealed for various temperature (T=300°C, 400°C, 500°C and 600°C) to selectively achieve a high density, well-spaced and diameter controlled Ag nanoparticles (AgNPs) on the Si/SiO2 substrates. The sacrificial layer of AgNPs size indicates the controlled diameter of the Si nanowire arrays. Image J analysis for various annealed samples gives an indication of the high density, uniformity and equal distribution of closely packed AgNPs. Furthermore, the AgNPs covered with Au/Pd mesh (5 nm) as a template, was removed by ultrasonication in the etchant solution for several times in different intervals of preparation. The conventional and facile metal assisted electroless etching approach was finally employed to fabricate the vertically aperiodic sub-50 nm SiNWAs, can be applicable to various nanoscale opto-electronic applications.
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11 May 2018
INTERNATIONAL CONFERENCE ON NANOMATERIALS FOR ENERGY CONVERSION AND STORAGE APPLICATIONS: NECSA 2018
29–31 January 2018
Gujarat, India
Research Article|
May 11 2018
Achieving sub-50 nm controlled diameter of aperiodic Si nanowire arrays by ultrasonic catalyst removal for photonic applications
Harsh A. Chaliyawala;
Harsh A. Chaliyawala
a
1
Solar Research and Development Center, School of Solar Energy, Pandit Deendayal Petroleum University
, Raisan, Gandhinagar-382007, Gujarat, India
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Zeel Purohit;
Zeel Purohit
b
2
Department of Science, School of Technology, Pandit Deendayal Petroleum University
, Raisan, Gandhinagar - 382007, Gujarat, India
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Sakshum Khanna;
Sakshum Khanna
c
1
Solar Research and Development Center, School of Solar Energy, Pandit Deendayal Petroleum University
, Raisan, Gandhinagar-382007, Gujarat, India
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Abhijit Ray;
Abhijit Ray
d
1
Solar Research and Development Center, School of Solar Energy, Pandit Deendayal Petroleum University
, Raisan, Gandhinagar-382007, Gujarat, India
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Ranjan K. Pati;
Ranjan K. Pati
e
1
Solar Research and Development Center, School of Solar Energy, Pandit Deendayal Petroleum University
, Raisan, Gandhinagar-382007, Gujarat, India
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Indrajit Mukhopadhyay
Indrajit Mukhopadhyay
f
1
Solar Research and Development Center, School of Solar Energy, Pandit Deendayal Petroleum University
, Raisan, Gandhinagar-382007, Gujarat, India
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AIP Conf. Proc. 1961, 030043 (2018)
Citation
Harsh A. Chaliyawala, Zeel Purohit, Sakshum Khanna, Abhijit Ray, Ranjan K. Pati, Indrajit Mukhopadhyay; Achieving sub-50 nm controlled diameter of aperiodic Si nanowire arrays by ultrasonic catalyst removal for photonic applications. AIP Conf. Proc. 11 May 2018; 1961 (1): 030043. https://doi.org/10.1063/1.5035245
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