The paper presents research results on the adhesion properties of Si coatings synthesized by different methods and under different conditions of preliminary vacuum ion plasma treatment of substrates with subsequent magnetron sputtering. The substrate surface was pretreated with low-energy ion beams, high-energy ion beams, gas discharge plasma, and plasma produced by a magnetron sputtering system. The vacuum conditions (pump type, pressure, etc.), the ion current density, and the bias parameters (pulse repetition frequency and duration) were varied. The research results demonstrate a considerable effect of plasma immersion ion implantation on the adhesion of Si coatings to NiTi substrates.
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