The paper presents research results demonstrating the influence of bias on the homogeneity of plasma immersion ion implantation. The research results allow the conclusion that plasma immersion ion implantation can be used to advantage for surface modification of medical materials, e.g., nickel-titanium (NiTi) alloys. In particular, doing of NiTi with silicon at pulsed bias provides highly homogeneous surface treatment.
REFERENCES
1.
K.
Otsura
and X.
Ren
, Prog. Mater. Sci.
5
(50
), 511
(2005
).2.
D.
Stoeckel
, A.
Pelton
, and T.
Duerig
, Eur. Radiol.
2
(14
), 292
(2004
).3.
J.
Van Humbeeck
. Scripta Mater.
50
, 179
(2004
).4.
T.
Ziebart
, A.
Schnell
, C.
Walter
, et al., Clin. Oral Investig.
17
(1
), 301
(2013
).5.
L. L.
Meisner
, A. I.
Lotkov
, V. A.
Matveeva
, et al., Adv. Mater. Sci. Eng.
(2012
). doi .6.
D. P.
Borisov
, N. N.
Koval
, V. M.
Kuznetsov
, et al., IEEE Trans. Plasma Sci.
41
, 2183
(2013
).7.
O. A.
Kashin
, A. I.
Lotkov
, A. N.
Kudryashov
, et al., AIP Conf. Proc.
1683
, 020078
(2015
).8.
A. I.
Lotkov
, O. A.
Kashin
, Yu. A.
Kudryavtseva
, et al., AIP Conf. Proc.
1683
, 020126
(2015
).
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