In this report, vanadium pentoxide nanostructured thin films (NSTs) with nanoplates (NPs) have synthesized on Ni coated glass substrate employing plasma assisted sublimation process (PASP), as a function of deposition/growth durations. The effect of deposition durations on the morphological, structural, vibrational, and compositional properties have been investigated one by one. The structural and vibrational studies endorsed that the grown NPs have only orthorhombic phase, no other sub oxide phases are recorded in the limit of resolution. The morphological results of all samples using SEM, revealed that the features, coverage density, and alignments of NPs are greatly controlled by deposition duration and the best sample is obtained for 25 min (S2). Further, the more insight information is accomplished by HRTEM/SAED on the best featured sample, which confirmed the single crystalline nature of NPs. The XPS result again confirmed the compositional purity and the nearly stoichiometric nature of NPs.
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23 May 2016
DAE SOLID STATE PHYSICS SYMPOSIUM 2015
21–25 December 2015
Uttar Pradesh, India
Research Article|
May 23 2016
Effective role of deposition duration on the growth of V2O5 nanostructured thin films Available to Purchase
Rabindar Kumar Sharma;
Rabindar Kumar Sharma
*
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
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Sujit Kumar Saini;
Sujit Kumar Saini
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
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Megha Singh;
Megha Singh
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
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G. B. Reddy
G. B. Reddy
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
Search for other works by this author on:
Rabindar Kumar Sharma
*
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
Sujit Kumar Saini
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
Megha Singh
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
G. B. Reddy
Thin film laboratory, Department of Physics,
Indian Institute of Technology Delhi
, New Delhi – 110016, India
*
Email:[email protected]
AIP Conf. Proc. 1731, 080011 (2016)
Citation
Rabindar Kumar Sharma, Sujit Kumar Saini, Megha Singh, G. B. Reddy; Effective role of deposition duration on the growth of V2O5 nanostructured thin films. AIP Conf. Proc. 23 May 2016; 1731 (1): 080011. https://doi.org/10.1063/1.4947889
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