Impression of plasma voltage on growth of α-V₂O₅ nanostructured thin films Available to Purchase

In this communication, we synthesized vanadium pentoxide (α-V₂O₅) nanostructured thin films (NST_s) accompanied with nanoflakes/ nanoplates on the Ni-coated glass substrates employing plasma assisted sublimation process (PASP) as a function of plasma voltage (V_p). The effect of plasma voltage on structural, morphological, compositional, and vibrational properties have been studied systematically. The structural analysis divulged that all films deposited at different V_p have pure orthorhombic phase, no impurity phase is detected under resolution limit of XRD and XPS. The morphological studies of samples is carried out by SEM, revealed that features as well as alignment of V₂O₅ NST_s is greatly monitored by V_p and the film possessing the best features is obtained at 2500volt. In addition, XPS results reveal that V⁵⁺ oxidation state is the most prominent state in sample V₂, which represents better stoichiometric nature of film. The vibrational study of all samples is performed by FTIR and strongly support the XRD observations. All the results are in consonance with each other.