We have developed a new implantation tool for the generation 5.5 glass. 150 cm high ion beams, which are bigger than the glass height, are extracted from the ion source. After being bent by the mass separation magnet, the beams reach the glass which is standing upright. The new tool exhibits high throughput in high dose applications because of high beam current capability. To cut down on time and workload of maintenance, dedicated kits were designed. A new cleaning method developed to extend the ion source lifetime showed excellent performance of reduction in the beam glitches.

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