Textured growth of Co film on CoO (fcc) layer; Structural studies using EDXRD beamline at Indus-2 Available to Purchase

Co film of 13 nm thickness has been deposited on native oxide (CoO) layer using electron beam evaporation technique. CoO (fcc) of 2.3 nm thickness has been prepared by oxidizing surface of 50 nm thick Co (fcc) by thermal annealing. The structure of the sample has been investigated in detail using in-plane and out-of-plane energy dispersive grazing incidence x-ray diffraction (GIXRD) at EDXRD beamline, Indus-2, RRCAT, Indore. It is found that the growth of the Co film takes place with preferential orientation of c-axis perpendicular to the film plane, which results in structure induced magnetic anisotropy with easy axis normal to the film plane.